Method for limiting the growth of microorganisms using metal-containing compounds
First Claim
1. A method for limiting growth of a microorganism comprising:
- exposing a microorganism to an effective amount of a composition comprising a metal-containing compound having the following chemical structure;
wherein;
Z1 and Z2 each independently represent an arene nucleus, having from 5 to 14 ring atoms;
G1 and G2 each independently represent a metal ligating group, wherein G1 and G2 may be contained within or pendant from at least one of Z1 and Z2;
R represents a hydrogen atom, a halogen atom, an alkyl group, an acylamino group, an alkoxy group, a sulfonamido group, an aryl group, a thiol group, an alkylthio group, an arylthio group, an alkylamino group, an arylamino group, an amino group, an alkoxycarbonyl group, an acyloxy group, a nitro group, a cyano group, an alkylsulfonyl group, an arylsulfonyl group, an alkylsulfoxyl group, an arylsulfoxyl group, an aryloxyl group, a hydroxyl group, a thioamido group, a carbamoyl group, a sulfamoyl group, a formyl group, an acyl group, a ureido group, an aryloxycarbonyl group, a silyl group, or a sulfoalkoxy group;
L1 represents a nitrogen heterocycle, substituted with R1 or R2 or both R1 and R2;
R1 and R2 each independently represent a hydrogen, a halogen atom, an alkyl group, including vinyl groups, hydroxyalkyl groups, an acylamino group, an alkoxy group, a sulfonamido group, an aryl group, an alkylthio group, an alkylamino group, an alkoxycarbonyl group, an acyloxy group, an alylsulfonyl group, an alkylsulfoxyl group, an alkylcarbamoyl group, an alkylsulfamoyl group, a formyl group, an acyl group, a silyl group, or a sulfoalkoxy group;
L2 represents a monodentate or polydentate ligand;
X represents nitrogen or a methine (CH) group;
M is selected from the group consisting of platinum and palladium; and
k, m, and n are whole numbers less than or equal to 3.
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Accused Products
Abstract
This invention relates to the use of compounds having the general structure:
wherein: Z1 and Z2 each independently represent an arene nucleus, which has from 5 to 14 ring atoms; G1 and G2 each independently represent a metal ligating group; R represents a hydrogen atom, a halogen atom, an alkyl group, an acylamino group, an alkoxy group, a sulfonamido group, an aryl group, a thiol group, an alkylthio group, an arylthio group, an alkylamino group, an arylamino group, an amino group, an alkoxycarbonyl group, an acyloxy group, a nitro group, a cyano group, an alkylsulfonyl group, an arylsulfonyl group, an alkylsulfoxyl group, an arylsulfoxyl group, an aryloxyl group, a hydroxyl group, a thioamido group, a carbamoyl group, a suffamoyl group, a formyl group, an acyl group, a ureido group, an aryloxycarbonyl group, a silyl group, or a sulfoalkoxy group; L1 represents a nitrogen heterocycle; L2 represents a monodentate or polydentate (e.g., bidentate) ligand; X represents nitrogen or a methine (CH) group; M is a divalent or polyvalent transition metal ion where the coordination number is at least 4; and k, m, and n are whole numbers less than or equal to 3 as antimicrobial agents to inhibit the growth or replication of microorganisms such as viruses, bacteria, and fungi.
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Citations
42 Claims
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1. A method for limiting growth of a microorganism comprising:
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exposing a microorganism to an effective amount of a composition comprising a metal-containing compound having the following chemical structure;
wherein;
Z1 and Z2 each independently represent an arene nucleus, having from 5 to 14 ring atoms;
G1 and G2 each independently represent a metal ligating group, wherein G1 and G2 may be contained within or pendant from at least one of Z1 and Z2;
R represents a hydrogen atom, a halogen atom, an alkyl group, an acylamino group, an alkoxy group, a sulfonamido group, an aryl group, a thiol group, an alkylthio group, an arylthio group, an alkylamino group, an arylamino group, an amino group, an alkoxycarbonyl group, an acyloxy group, a nitro group, a cyano group, an alkylsulfonyl group, an arylsulfonyl group, an alkylsulfoxyl group, an arylsulfoxyl group, an aryloxyl group, a hydroxyl group, a thioamido group, a carbamoyl group, a sulfamoyl group, a formyl group, an acyl group, a ureido group, an aryloxycarbonyl group, a silyl group, or a sulfoalkoxy group;
L1 represents a nitrogen heterocycle, substituted with R1 or R2 or both R1 and R2;
R1 and R2 each independently represent a hydrogen, a halogen atom, an alkyl group, including vinyl groups, hydroxyalkyl groups, an acylamino group, an alkoxy group, a sulfonamido group, an aryl group, an alkylthio group, an alkylamino group, an alkoxycarbonyl group, an acyloxy group, an alylsulfonyl group, an alkylsulfoxyl group, an alkylcarbamoyl group, an alkylsulfamoyl group, a formyl group, an acyl group, a silyl group, or a sulfoalkoxy group;
L2 represents a monodentate or polydentate ligand;
X represents nitrogen or a methine (CH) group;
M is selected from the group consisting of platinum and palladium; and
k, m, and n are whole numbers less than or equal to 3. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29)
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30. A method for disinfecting a surface comprising:
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applying a composition comprising a metal-containing compound to a surface, the metal-containing compound having the general structure;
wherein;
Z1 and Z2 each independently represent an arene nucleus, having from 5 to 14 ring atoms;
G1 and G2 each independently represent a metal ligating group, wherein G1 and G2 may be contained within or pendant from at least one of Z1 and Z2;
R represents a hydrogen atom, a halogen atom, an alkyl group, an acylamino group, an alkoxy group, a sulfonamido group, an aryl group, a thiol group, an alkylthio group, an arylthio group, an alkylamino group, an arylamino group, an amino group, an alkoxycarbonyl group, an acyloxy group, a nitro group, a cyano group, an alkylsulfonyl group, an arylsulfonyl group, an alkylsulfoxyl group, an arylsulfoxyl group, an aryloxyl group, a hydroxyl group, a thioamido group, a carbamoyl group, a sulfamoyl group, a formyl group, an acyl group, a ureido group, an aryloxycarbonyl group, a silyl group, or a sulfoalkoxy group;
L1 represents a nitrogen heterocycle, substituted with R1 or R2 or both R1 and R2;
R1 and R2 each independently represent a hydrogen, a halogen atom, an alkyl group, including vinyl groups, hydroxyalkyl groups, an acylamino group, an alkoxy group, a sulfonamido group, an aryl group, an alkylthio group, an alkylamino group, an alkoxycarbonyl group, an acyloxy group, an alylsulfonyl group, an alkylsulfoxyl group, an alkylcarbamoyl group, an alkylsulfamoyl group, a formyl group, an acyl group, a silyl group, or a sulfoalkoxy group;
L2 represents a monodentate or polydentate ligand;
X represents nitrogen or a methine (CH) group;
M is selected from the group consisting of platinum and palladium;
and k, m, and n are whole numbers less than or equal to 3. - View Dependent Claims (31, 32, 33)
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34. A method for limiting the growth of a virus, bacterium and/or a fungus comprising:
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contacting the virus, bacterium or fungus with a composition comprising a metal-containing compound having the following formula;
wherein R1 and R2 are each independently selected from the group consisting of H, CH2OH, CH═
CH2 and CH2CH3, X is a methine (CH) group, and M is Pt.- View Dependent Claims (35)
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36. A metal-containing compound having the general structure:
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wherein R1 is CH2OH [or CH2CH3], R2 is H, [Z] X ia a methine (CH) group, and M is Pt.
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37. A method for limiting growth of a microorganism comprising:
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exposing a microorganism to am effective amount of a composition comprising a metal-containing compound having a chemical structure of compound 1;
wherein;
R1 and R2 each independently represent a hydrogen, a halogen atom, an alkyl group, including vinyl groups, hydroxyalkyl groups, an acylamino group, an alkoxy group, a sulfonamido group, an aryl group, an alkylthio group, an alkylamino group, an alkocycarbonyl group, an acyloxy group, an alylsulfonyl group, an alkylsulfoxyl group, an alkylcarbamoyl group, an alkylsulfamoul group, a formyl group, an acyl group, a silyl group, or a sulfoalkoxy group;
X represents nitrogen or a methine (CH) group; and
M is a divalent or polyvalent transition metal ion where the coordination number is at least 4.
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38. A method for limiting growth of a virus comprising:
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exposing a microorganism to an effective amount of a composition comprising a metal-containing compound having the following chemical structure;
wherein;
Z1 and Z2 each independently represent an arene nucleus, having from 5 to 14 ring atoms;
G1 and G2 each independently represent a metal ligating group, wherein G1 and G2 may be contained within or pendant from at least one of Z1 and Z2. R represents a hydrogen atom, a halogen atom, an alkyl group, an acylamino group, an alkoxy group, a sulfonamido group, an aryl group, a thiol group, an alkylthio group, an arylthio group, an alkylamino group, an arylamino group, an amino group, an alkoxycarbonyl group, an acyloxy group, a notro group, a cyano group, an alkylsulfonyl group, an arylsulfonyl group, an alkylsulfoxyl group, an arylsulfoxyl group, an aryloxyl group, a hydroxyl group, a thioamido group, a carbamoyl group, a sulfamoyl group, a formyl group, an acyl group, a ureido group an aryloxycarbonyl group, a silyl group, or a sulfoalkoxy group;
L1 represints a nitrogen heterocycle, substituted with R1 or R2 or both R1 and R2;
R1 and R2 each independently represent a hydrogen, a halogen atom, an alkyl group, including vinyl groups, hydroxyalkyl groups, an acylamino group, an alkoxy group, a sufonamido group, an aryl group, an alkylthio group, an alkylamino group, an alkoxycarbonyl group, an acyloxy group, an alylsulfonyl group, an alkylsulfoxyl group, an alkylcarbamoyl group, an alkylsulfamoyl group, a formyl group, an acyl group, a silyl group, or a sulfoalkoxy group;
L2 represints a monodentate or polydenatee ligand;
X represents nitrogen or methine (CH) group;
M is a divalent or polyvalent transition metal ion where the coordination number is at least 4; and
k, m, and n are whole numbers less than or equal to 3. - View Dependent Claims (39, 40, 41, 42)
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Specification