Method for applying a barrier layer to a silicon based substrate
First Claim
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1. A method of preparing an article comprising the steps of:
- (a) providing a substrate comprising silicon;
(b) heating the silicon containing substrate to a temperature T of greater than or equal to about 1100°
C.;
(c) applying a barrier layer comprising barium-strontium aluminosilicate to the silicon containing substrate at the temperature T to provide a coated substrate;
(d) thereafter holding the coated substrate at the temperature T for a time period of greater than or equal to about 15 minutes; and
(e) cooling the coated substrate wherein the cooled coated substrate, prior to a subsequent heat treating, has a barrier layer having a crystalline structure of at least about 80% by volume.
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Abstract
A method for applying a barrier layer which comprises a barium-strontium aluminosilicate to a silicon containing substrate which inhibits the formation of cracks.
59 Citations
26 Claims
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1. A method of preparing an article comprising the steps of:
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(a) providing a substrate comprising silicon;
(b) heating the silicon containing substrate to a temperature T of greater than or equal to about 1100°
C.;
(c) applying a barrier layer comprising barium-strontium aluminosilicate to the silicon containing substrate at the temperature T to provide a coated substrate;
(d) thereafter holding the coated substrate at the temperature T for a time period of greater than or equal to about 15 minutes; and
(e) cooling the coated substrate wherein the cooled coated substrate, prior to a subsequent heat treating, has a barrier layer having a crystalline structure of at least about 80% by volume. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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Specification