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Use of attenuating phase-shifting mask for improved printability of clear-field patterns

  • US 6,255,024 B1
  • Filed: 03/30/2000
  • Issued: 07/03/2001
  • Est. Priority Date: 12/30/1997
  • Status: Expired due to Term
First Claim
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1. A photolithographic method comprising:

  • illuminating a photomask that includes one or more transmission areas intermingled with one or more transparent areas, including;

    illuminating amplitude-attenuating, phase-shifting material on the photomask in the one or more transmission areas; and

    illuminating a plurality of subresolution openings in the one or more transmission areas.

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