Amorphous dielectric capacitors on silicon
First Claim
1. A capacitor comprising an amorphous dielectric having a dielectric constant of 10 or greater deposited directly on a silicon-containing electrode, wherein said amorphous dielectric material is formed under conditions that minimize formation of any interfacial layers or grain boundaries on said silicon-containing substrate.
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Accused Products
Abstract
High-capacity capacitors and gate insulators exhibiting moderately high dielectric constants with surprisingly low leakage using amorphous or low temperature films of perovskite type oxides including a titanate system material such as barium titanate, strontium titanate, barium strontium titanate (BST), lead titanate, lead zirconate titanate, lead lanthanum zirconate titanate, barium lanthanum titanate, a niobate, aluminate or tantalate system material such as lead magnesium niobate, lithium niobate lithium tantalate, potassium niobate and potassium tantalum niobate, a tungsten-bronze system material such as barium strontium niobate, lead barium niobate, barium titanium niobate, and Bi-layered perovskite system material such as strontium bismuth tantalate, bismuth titanate deposited directly on a silicon surface at temperatures about 450° C. or less.
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Citations
26 Claims
- 1. A capacitor comprising an amorphous dielectric having a dielectric constant of 10 or greater deposited directly on a silicon-containing electrode, wherein said amorphous dielectric material is formed under conditions that minimize formation of any interfacial layers or grain boundaries on said silicon-containing substrate.
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11. A method for forming a capacitor comprising an amorphous dielectric material having a dielectric constant of 10 or greater deposited directly on a silicon-containing material comprising the steps of:
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(a) preparing a bottom electrode, said bottom electrode being composed of Si or a Si-containing material;
(b) forming an amorphous dielectric material on top of the bottom electrode;
(c) annealing the amorphous dielectric material at a temperature which is effective in improving the quality as well as the dielectric constant of the amorphous dielectric material; and
(d) fabricating a top conductive electrode on said annealed amorphous dielectric material. - View Dependent Claims (12, 13, 14)
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- 15. A gate insulator for use in a transistor comprising an amorphous dielectric material having a dielectric constant of 10 or greater.
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22. A method of fabricating a transistor comprising an amorphous dielectric constant material as a gate insulator comprising the steps of:
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(a) forming an amorphous dielectric material on a structure containing a semiconducting electrode, said amorphous dielectric material having a dielectric constant of 10 or above;
(b) annealing the amorphous dielectric material at a temperature which is effective in improving the quality as well as the dielectric constant of the amorphous dielectric material; and
(c) forming a gate conductor on said annealed amorphous dielectric material. - View Dependent Claims (23, 24, 25, 26)
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Specification