Method for forming a semiconductor device
First Claim
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1. A method for forming a semiconductor device comprising:
- forming a first metal-containing layer over a substrate, wherein the first metal-containing layer has a first pre-anneal compressive/tensile stress;
forming a source region, a drain region and a channel between the source region and the drain region, wherein at least a portion of the channel is under the first metal-containing layer;
forming a second metal-containing layer over the first metal-containing layer, wherein the second metal-containing layer has a second pre-anneal compressive/tensile stress, and wherein a combination of at least the second metal-containing layer over the first metal-containing layer forms a gate electrode stack; and
annealing the gate electrode stack, wherein a composite post-anneal compressive/tensile stress of the gate electrode stack is less than an individual post-anneal compressive/tensile stress of either one of a separately annealed first metal-containing layer and a separately annealed second metal-containing layer.
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Abstract
A first metal-containing material (22) is formed over a semiconductor device substrate (10). A second metal-containing material (32) is formed over the first metal containing material (22). The combination of the second metal-containing material (32) formed over the first metal-containing material (22) forms a metal stack (34). The metal stack (34) is annealed and a post-anneal stress of the metal stack (34) is less than an individual post-anneal stress of either one of the first conductive film (22) or the second conductive film (32).
37 Citations
19 Claims
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1. A method for forming a semiconductor device comprising:
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forming a first metal-containing layer over a substrate, wherein the first metal-containing layer has a first pre-anneal compressive/tensile stress;
forming a source region, a drain region and a channel between the source region and the drain region, wherein at least a portion of the channel is under the first metal-containing layer;
forming a second metal-containing layer over the first metal-containing layer, wherein the second metal-containing layer has a second pre-anneal compressive/tensile stress, and wherein a combination of at least the second metal-containing layer over the first metal-containing layer forms a gate electrode stack; and
annealing the gate electrode stack, wherein a composite post-anneal compressive/tensile stress of the gate electrode stack is less than an individual post-anneal compressive/tensile stress of either one of a separately annealed first metal-containing layer and a separately annealed second metal-containing layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A method for forming a semiconductor device comprising:
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forming a first dielectric layer over a substrate;
forming an opening in the first dielectric layer;
forming a first metal-containing layer within the opening;
forming a source region a drain region and a channel between the source region and the drain region, wherein at least a portion of the channel is under the first metal-containing layer;
forming a second metal-containing layer over the first metal-containing material, wherein a combination of the second metal-containing layer over the first metal-containing layer forms a portion of a gate electrode stack, and wherein a composite compressive/tensile stress of the portion of the gate electrode stack is less than an individual compressive/tensile stress of either one of the first metal-containing layer and the second metal-containing layer; and
removing portions of the second metal-containing material and the first metal-containing material lying outside of the opening to form and inlaid gate electrode structure. - View Dependent Claims (17, 18, 19)
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Specification