On-the-fly automatic defect classification for substrates using signal attributes
DCFirst Claim
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1. A method for on-the-fly automatic defect classification (ADC) in a scanned substrate, comprising:
- (a) providing at least two spaced apart detectors;
(b) illuminating the scanned substrate so as to generate an illuminating spot incident on the substrate;
(c) collecting light scattered from the spot by at least two spaced apart detectors;
(d) analyzing said collected light so as to detect defects in said substrate; and
(e) classifying said defects into distinct defect types by analyzing scattered light volume attribute and at least one other attribute of said collected light;
wherein said step for analysis for classifying defects utilizing scattered light attributes includes at least one of the following attributes;
scattered light intensity, scattered light linearity and scattered light asymmetry.
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Abstract
A system for on-the-fly automatic defect classification (ADC) in a scanned wafer. The system includes a light source illuminating the scanned wafer so as to generate an illuminating spot incident on the wafer. Sensor collecting light scattered from the spot by the at least two spaced apart detectors, and processor analyzing the collected light so as to detect defects in the wafer and classifying the defects into distinct defect types.
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Citations
41 Claims
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1. A method for on-the-fly automatic defect classification (ADC) in a scanned substrate, comprising:
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(a) providing at least two spaced apart detectors;
(b) illuminating the scanned substrate so as to generate an illuminating spot incident on the substrate;
(c) collecting light scattered from the spot by at least two spaced apart detectors;
(d) analyzing said collected light so as to detect defects in said substrate; and
(e) classifying said defects into distinct defect types by analyzing scattered light volume attribute and at least one other attribute of said collected light;
wherein said step for analysis for classifying defects utilizing scattered light attributes includes at least one of the following attributes;
scattered light intensity, scattered light linearity and scattered light asymmetry.
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2. A system for on-the-fly automatic defect classification (ADC) in a inspected substrate, comprising:
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(a) light source illuminating the inspected substrate;
(b) at least two spaced apart detectors situated to receive light scattered from the substrate and generating corresponding signals;
(c) a processor analyzing said signals so as to detect defects in said substrate; and
(d) a defect classifier analyzing scattered light volume attribute and at least one other attribute of said signals and classifying said defects into distinct defect types;
wherein said attributes correspond to at least one of the following attributes;
scattered light intensity, scattered light linearity and reflected light asymmetry.- View Dependent Claims (3, 4, 5, 6)
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7. A method for on-the-fly automatic defect classification (ADC) in a scanned substrate, comprising:
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(a) providing at least two spaced apart detectors;
(b) illuminating the scanned substrate so as to generate an illuminating spot incident on the substrate;
(c) collecting light scattered from the spot by the at least two spaced apart detectors;
(d) analyzing said collected light so as to detect defects in said substrate and classifying said defects into distinct defect types; and
(e) classifying said defects into defect types by analyzing a scattered light volume attribute and at least one other attribute of said collecting light. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A system for on-the-fly automatic defect classification (ADC) in an inspected substrate, comprising:
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(a) light source illuminating the inspected substrate;
(b) at least two spaced apart detectors situated to receive light scattered from the substrate and generating corresponding signals;
(c) a processor analyzing said signals so as to detect defects in said substrate; and
(d) a defect classifier analyzing a scattered light volume attribute and at least one other attribute of said signals and classifying said defects into distinct defect types. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34)
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35. In a system for on-the-fly automatic defect classification (ADC) in a scanned wafer, a processor programmed to perform the steps comprising:
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receiving signals from at least two spaced apart detectors, which signals are indicative of light scattered from the wafer and detected by said detectors; and
analyzing a scattered light volume and at least one other attribute of said signals so as to detect defects in said wafer and classifying said defects into distinct defect types.
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36. An inspection system for inspecting substrates for defects, comprising:
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a light source illuminating said substrate;
at least two detectors situated to detect light scattered from the substrate and generate at least a first and second inspection signals;
a comparator receiving and comparing said at least first and second inspection signals to at least a first and second reference signals, respectively, to detect defects in said substrate and identify defect locations;
a classifier receiving said at least said first and second inspection signals and analyzing a scattered light volume and at least one other attribute of said at least first and second inspection signals corresponding to said defect locations, and classifying said defects according to said attributes. - View Dependent Claims (37, 38, 39, 40, 41)
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Specification