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Vaporization and deposition apparatus

  • US 6,258,170 B1
  • Filed: 09/11/1997
  • Issued: 07/10/2001
  • Est. Priority Date: 09/11/1997
  • Status: Expired due to Term
First Claim
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1. A process chamber for depositing a film, comprising:

  • a) a chamber body forming an enclosure having one or more temperature controlled surfaces;

    b) a lid movably mounted on the chamber body, the lid having a heated main body and an outer temperature controlled collar;

    c) a heated gas distribution assembly comprising a gas manifold connected to a gas distribution member, the gas manifold adapted to deliver one or more gases into the gas distribution member, and;

    d) an exhaust port connected to the chamber body, the exhaust port having a temperature controlled liner disposed therein.

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