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Mask image scanning exposure method

  • US 6,261,728 B1
  • Filed: 10/19/1998
  • Issued: 07/17/2001
  • Est. Priority Date: 10/19/1998
  • Status: Expired due to Term
First Claim
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1. A dynamic mask exposure method comprising:

  • providing a support for a workpiece, providing a source of a beam of exposure radiation, providing a transmissive dynamically changing, phase-shifting mask comprising a spatial light modulator with orthogonally arranged matrices of actuator lines and binary pixel units which are opaque or transparent as a function of control inputs from a control system to the actuator lines, the transmissive dynamically changing, phase-shifting mask having a top surface and a bottom surface, supplying pixel control signals to the actuator lines of the transmissive dynamically changing, phase-shifting mask to form a pattern of transparent regions and opaque regions, directing the beam from the source down onto the top surface of the transmissive dynamically changing, phase-shifting mask, locating an image detection element for detecting a pattern of radiation projected thereon from said spatial light modulator, said image detection element being located on the top surface of the support, passing the beam from the top surface of the transmissive dynamically changing, phase-shifting mask through the transparent regions and thereby projecting a pattern from the transmissive dynamically changing, phase-shifting mask onto the support where the image detection element is located, providing signals representing the pattern projected onto the image detection element from the transmissive dynamically changing, phase-shifting mask back to the control system by connections from the image detection element to the control system, and employing the control system to compare detected pattern data to patterning data in a data base.

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