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Inspection method and apparatus using electron beam

  • US 6,265,719 B1
  • Filed: 10/30/1998
  • Issued: 07/24/2001
  • Est. Priority Date: 10/31/1997
  • Status: Expired due to Fees
First Claim
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1. An electron beam inspection apparatus comprising:

  • an electron beam irradiation unit configured to irradiate a sample with an electron beam;

    a mapping projection optical unit configured to form at least one of one-dimensional and two-dimensional images of secondary and reflected electrons produced in accordance with a sample surface of the sample upon irradiating the sample with the electron beam by said electron beam irradiation unit;

    an electron beam detection unit configured to output a detection signal based on the at least one of one-dimensional and two-dimensional images of the secondary and reflected electrons formed on said electron beam detection unit by said mapping projection optical unit;

    an image display unit configured to receive the detection signal output from said electron beam detection unit and display the at least one of one-dimensional and two-dimensional images of the sample surface; and

    an electron beam deflection unit configured to deflect the electron beam received from said electron beam irradiation unit onto the sample and allow said mapping projection optical unit to capture the secondary and reflected electrons received from the sample;

    wherein said electron beam deflection unit receives the electron beam from said electron beam irradiation unit at an angle of 10°

    to 40°

    from an axis running perpendicular to the sample and changes an angle of the electron beam to make the electron beam be incident on the sample at 90°

    ±



    .

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