Crystallized glass, substrate for magnetic disc, magnetic disc and method of producing crystallized glass
First Claim
Patent Images
1. A crystallized glass, which has a main crystal phase of α
- -quartz (SiO2) and lithium disilicate (Li2O·
2SiO2) and has a thermal expansion coefficient of (90˜
130)×
10−
7/K at −
50°
C.˜
70 °
C., comprising a following chemical composition;
70 wt %≦
SiO2≦
80 wt %, 5 wt %≦
Al2O3≦
9 wt %, 7 wt %≦
Li2O<
10 wt %, 1 wt %≦
P2O5≦
3 wt %, 0 wt %≦
K2O≦
3 wt %, 0 wt %≦
CaO≦
3 wt %, 0 wt %≦
BaO≦
4 wt %, 0 wt %≦
ZnO≦
4 wt %, 0 wt %≦
Sb2O3≦
1 wt %, 0 wt %≦
ZrO2≦
6 wt %, 0 wt %≦
Nb2O5≦
6 wt %, 0 wt %≦
SnO2≦
4 wt %, 0 wt %≦
MoO3≦
3 wt %, 0.7 wt %≦
(Nb2O5+SnO2+MoO3)≦
6 wt %.
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Abstract
A crystallized glass has a main crystal phase of α-quartz (SiO2) and lithium disilicate (Li2·2SiO2) and has a thermal expansion coefficient of (90˜130)×10−7/K at −50° C.˜70° C. The crystallized glass mentioned above, has a following chemical composition; 70 wt %≦SiO2≦80 wt %, 5 wt %≦Al2O3≦9 wt %, 7 wt %≦Li2O≦10 wt %, 1 wt %≦P2O5≦3 wt %, 0 wt %≦K2O≦3 wt %, 0 wt %≦CaO≦3 wt %, 0 wt %≦BaO≦4 wt %, 0 wt %≦ZnO≦4 wt %, 0 wt %≦Sb2O3≦1 wt %, 0 wt %≦ZrO2≦6 wt %, 0 wt %≦Nb2O5≦6 wt %, 0 wt %≦SnO2≦4 wt %, 0 wt %≦MoO3≦3 wt %, 0.7 wt %≦(Nb2O5+SnO2+MoO3)≦6 wt %.
76 Citations
6 Claims
-
1. A crystallized glass, which has a main crystal phase of α
- -quartz (SiO2) and lithium disilicate (Li2O·
2SiO2) and has a thermal expansion coefficient of (90˜
130)×
10−
7/K at −
50°
C.˜
70 °
C., comprising a following chemical composition;
70 wt %≦
SiO2≦
80 wt %, 5 wt %≦
Al2O3≦
9 wt %, 7 wt %≦
Li2O<
10 wt %, 1 wt %≦
P2O5≦
3 wt %, 0 wt %≦
K2O≦
3 wt %, 0 wt %≦
CaO≦
3 wt %, 0 wt %≦
BaO≦
4 wt %, 0 wt %≦
ZnO≦
4 wt %, 0 wt %≦
Sb2O3≦
1 wt %, 0 wt %≦
ZrO2≦
6 wt %, 0 wt %≦
Nb2O5≦
6 wt %, 0 wt %≦
SnO2≦
4 wt %, 0 wt %≦
MoO3≦
3 wt %, 0.7 wt %≦
(Nb2O5+SnO2+MoO3)≦
6 wt %. - View Dependent Claims (2, 3, 4, 5)
- -quartz (SiO2) and lithium disilicate (Li2O·
-
6. A method of producing a crystallized glass comprising the steps of;
- preparing a parent glass having the following chemical composition, subjecting the parent glass to a heat treatment at 570°
C.˜
640°
C. so as to perform a nucleus generation, and subjecting the parent glass to a heat treatment at 670°
C.˜
750°
C. so as to crystallize the parent glass;
70 wt %≦
SiO223 80 wt %, 5 wt %≦
Al2O3≦
9 wt %, 7 wt %≦
Li2O<
10 wt %, 1 wt %≦
P2O5≦
3 wt %, 0 wt %≦
K2O≦
3 wt %, 0 wt %≦
CaO≦
3 wt %, 0 wt %≦
BaO≦
4 wt %, 0 wt %≦
ZnO≦
4 wt %, 0 wt %≦
Sb2O3≦
1 wt %, 0 wt %≦
ZrO2≦
6 wt %, 0 wt %≦
Nb2O5≦
6 wt %, 0 wt %≦
SnO2≦
4 wt %, 0 wt %≦
MoO3≦
3 wt %, 0.7 wt %≦
(Nb2O5+SnO2+MoO3)≦
6 wt %.
- preparing a parent glass having the following chemical composition, subjecting the parent glass to a heat treatment at 570°
Specification