Process for integrating dielectric optical coatings into micro-electromechanical devices

• US 6,271,052 B1
• Filed: 10/19/2000
• Issued: 08/07/2001
• Est. Priority Date: 10/19/2000
• Status: Expired due to Term

• Current Assignee: Axsun Technologies Incorporated
• Original Assignee: Axsun Technologies Incorporated
• Inventors: Cook, Christopher C., Flanders, Dale C., Miller, Michael F., Le, Minh Van
• Primary Examiner(s): Nelms, David
• Assistant Examiner(s): HOANG, QUOC DINH
• Application Number:
  US09/692,639
• Time in Patent Office: 292 Days
• Field of Search: 438/97, 438/48, 438/50, 438/712, 257/417
• US Class Current: 438/50
• CPC Class Codes: B81B 2201/042 Micromirrors, not used as optical switches
• CPC Class Codes: B81B 3/0083 Optical properties
• CPC Class Codes: B81C 1/00476 removing a sacrificial layer B81C1/00912 takes precedence
• CPC Class Codes: B81C 1/00666 Treatments for controlling internal stress or strain in MEMS structures
• CPC Class Codes: B81C 2201/0109 Sacrificial layers not provided for in B81C2201/0107 - B81C2201/0108
• CPC Class Codes: B81C 2201/053 Depositing a protective layers
• CPC Class Codes: G02B 26/001 based on interference in an adjustable optical cavity interference filters G02B5/28; devices or arrangements using multiple reflections in spectrometry or monochromators G01J3/26

Abstract

A process for fabricating an optical membrane from polycrystalline silicon comprises first forming a sacrificial layer on a handle wafer. Concavities are etched into the sacrificial layer. Polycrystalline silicon membrane layer is then formed on the sacrificial layer. The polycrystalline membrane layer is subsequently polished to achieve the predetermined membrane thickness and surface smoothness, annealed, and then patterned. Finally, the sacrificial layer is removed to release the membrane. The concavities in the sacrificial layer yield convexities in the polysilicon layer to prevent stiction adhesion to the handle wafer. During processing, a mask used to pattern the membrane layer functions to protect an highly reflecting (HR) coating for the membrane.

Claims

1. A process for fabricating a membrane with an optical coating, the process comprising:

forming a membrane layer;

depositing a high reflectivity (HR) coating on the membrane layer;

patterning the HR coating with a dry etch process to reside at least over a portion of an optical port region of the membrane layer;

patterning the membrane layer to form the membrane; and

removing at least part of a sacrificial layer to release the membrane.

2. A process as claimed in claim 1, wherein the step of removing the sacrificial layer is performed after the patterning of the HR coating.

3. A process as claimed in claim 1, wherein the step of patterning the HR coating comprises depositing and developing a photoresist layer.

4. A process as claimed in claim 1, further comprising protecting the HR coating during the step of patterning the membrane.

5. A process as claimed in claim 4, wherein in the step of protecting the HR coating comprises covering the HR coating with a photoresist layer that is used in the patterning of the membrane layer.

6. A process as claimed in claim 4, wherein in the step of protecting the HR coating comprises covering the HR coating with amorphous silicon that is used in the patterning of the membrane layer.

7. A process as claimed in claim 4, wherein in the step of protecting the HR coating comprises covering the HR coating with silicon nitride that is used in the patterning of the membrane layer.

8. A process as claimed in claim 4, wherein in the step of protecting the HR coating comprises covering the HR coating with a metal that is used in the patterning of the membrane layer.

9. A process as claimed in claim 1, further comprising polishing the polycrystalline silicon membrane layer to achieve a predetermined depth and surface smoothness.

10. A process as claimed in claim 1, wherein the membrane layer comprises polycrystalline silicon.

11. A process as claimed in claim 1, wherein the reflectivity of the HR coating is greater than 96%.

12. A process as claimed in claim 1, wherein the reflectivity of the HR coating is greater than 99%.

13. A process as claimed in claim 1, further comprising installing the membrane at one end of a laser cavity.

14. A process as claimed in claim 1, further comprising installing the membrane opposite a stationary reflector to form a tunable Fabry-Perot filter.

15. A process for fabricating a membrane with an optical coating, the process comprising:

forming a membrane layer;

depositing a high reflectivity (HR) coating on the membrane layer;

patterning the HR coating with reactive ion etching to reside at least over a portion of an optical port region of the membrane layer;

patterning the membrane layer to form the membrane; and

removing at least part of a sacrificial layer to release the membrane.

16. A process as claimed in claim 15, wherein the step of removing the sacrificial layer is performed after the patterning of the HR coating.

17. A process as claimed in claim 15, wherein the step of patterning the HR coating comprises depositing and developing a photoresist layer.

18. A process as claimed in claim 15, further comprising protecting the HR coating during the step of patterning the membrane.

19. A process as claimed in claim 18, wherein in the step of protecting the HR coating comprises covering the HR coating with a photoresist layer that is used in the patterning of the membrane layer.

20. A process for fabricating a membrane with an optical coating, the process comprising:

forming a membrane layer;

depositing a high reflectivity (HR) coating on the membrane layer;

patterning the HR coating with reactive ion milling to reside at least over portion of an optical port region of the membrane layer;

patterning the membrane layer to form the membrane; and

removing at least part of a sacrificial layer to release the membrane.

21. A process as claimed in claim 20, wherein the step of removing the sacrificial layer is performed after the patterning of the HR coating.

22. A process as claimed in claim 20, wherein the step of patterning the HR coating comprises depositing and developing a photoresist layer.

23. A process as claimed in claim 20, further comprising protecting the HR coating during the step of patterning the membrane.

24. A process as claimed in claim 23, wherein in the step of protecting the HR coating comprises covering the HR coating with a photoresist layer that is used in the patterning of the membrane layer.

25. A process for fabricating a membrane with an optical coating, the process comprising:

forming a membrane layer;

depositing a high reflectivity (HR) coating on the membrane layer;

patterning the HR coating to reside at least over a portion of an optical port region of the membrane layer wherein the HR has 4 or more dielectric layers;

patterning the membrane layer to form the membrane; and

removing at least part of a sacrificial layer to release the membrane.

26. A process as claimed in claim 25, wherein the step of removing the sacrificial layer is performed after the patterning of the HR coating.

27. A process as claimed in claim 25, wherein the step of patterning the HR coating comprises depositing and developing a photoresist layer.

28. A process as claimed in claim 25, further comprising protecting the HR coating during the step of patterning the membrane.

29. A process as claimed in claim 28, wherein in the step of protecting the HR coating comprises covering the HR coating with a photoresist layer that is used in the patterning of the membrane layer.

30. A process for fabricating a membrane with an optical coating, the process comprising:

forming a membrane layer;

depositing a high reflectivity (HR) coating on the membrane layer;

patterning the HR coating to reside at least over a portion of an optical port region of the membrane layer wherein the HR coating has 8 or more dielectric layers;

patterning the membrane layer to form the membrane; and

removing at least part of a sacrificial layer to release the membrane.

31. A process as claimed in claim 30, wherein the step of removing the sacrificial layer is performed after the patterning of the HR coating.

32. A process as claimed in claim 30, wherein the step of patterning the HR coating comprises depositing and developing a photoresist layer.

33. A process as claimed in claim 30, further comprising protecting the HR coating during the step of patterning the membrane.

34. A process as claimed in claim 33, wherein in the step of protecting the HR coating comprises covering the HR coating with a photoresist layer that is used in the patterning of the membrane layer.

35. A process for fabricating a membrane with an optical coating, the process comprising:

forming a membrane layer;

depositing a high reflectivity (HR) coating on the membrane layer;

patterning the HR coating to reside at least over a portion of an optical port region of the membrane layer wherein the HR coating has 16 or more dielectric layers;

patterning the membrane layer to form the membrane; and

removing at least part of a sacrificial layer to release the membrane.