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Apparatus for vaporizing liquid raw material and method of cleaning CVD apparatus

  • US 6,271,498 B1
  • Filed: 06/22/1998
  • Issued: 08/07/2001
  • Est. Priority Date: 06/23/1997
  • Status: Expired due to Fees
First Claim
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1. A method of cleaning a CVD apparatus having a vaporizer for vaporizing a liquid raw material by applying heat and a processing chamber for forming a thin film on a substrate by a CVD method by using the raw material vaporized by said vaporizer, comprising the steps of:

  • introducing a cleaning solution comprising components for dissolving residues generated in said vaporizer and said processing chamber into said vaporizer and heating the cleaning solution so as to vaporize the cleaning solution while removing residues in the vaporizer; and

    introducing an exhaust gas containing the components of the cleaning solution supplied from said vaporizer to the inside portion of said processing chamber so as to remove residues in said processing chamber.

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