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Methods involving direct write optical lithography

  • US 6,271,957 B1
  • Filed: 05/26/1999
  • Issued: 08/07/2001
  • Est. Priority Date: 05/29/1998
  • Status: Expired due to Fees
First Claim
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1. A method for deprotecting reaction sites on a substrate comprising the steps of:

  • providing a substrate having protected reaction sites;

    modulating light direction with a spatial light modulator so as to generate a predetermined light pattern used for deprotecting selected portions of said protected reaction sites.

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