Remote plasma cleaning method for processing chambers

• US 6,274,058 B1
• Filed: 07/02/1999
• Issued: 08/14/2001
• Est. Priority Date: 07/11/1997
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Tran, Huyen, Ablao, Alan, Casper, Tim, Liu, Patricia M., Narwankar, Pravin K., Rajagopalan, Ravi, Krishnaraj, Padmanabhan
• Primary Examiner(s): DANG, THI D
• Application Number:
  US09/347,236
• Time in Patent Office: 774 Days
• Field of Search: 134/22.1, 134/22.11, 216/67, 216/69, 438/905
• US Class Current: 216/67
• CPC Class Codes: C23C 16/4405 Cleaning of reactor or parts inside the reactor by using reactive gases
• CPC Class Codes: C23C 16/511 using microwave discharges
• CPC Class Codes: C23C 16/52 Controlling or regulating the coating process C23C16/45557, C23C16/279 take precedence
• CPC Class Codes: H01J 37/32192 Microwave generated discharge H01J37/32357, H01J37/32366, H01J37/32394, H01J37/32403 take precedence
• CPC Class Codes: H01J 37/32357 Generation remote from the workpiece, e.g. down-stream
• CPC Class Codes: H01J 37/32862 In situ cleaning of vessels and/or internal parts
• CPC Class Codes: H01J 9/38 Exhausting, degassing, filling, or cleaning vessels
• CPC Class Codes: Y10S 438/905 Cleaning of reaction chamber

Abstract

A processing chamber cleaning method is described which utilizes microwave energy to remotely generate a reactive species to be used alone or in combination with an inert gas to remove deposits from a processing chamber. The reactive species can remove deposits from a first processing region at a first pressure and then remove deposits from a second processing region at a second pressure. Also described is a cleaning process utilizing remotely generated reactive species in a single processing region at two different pressures. Additionally, different ratios of reactive gas and inert gas may be utilized to improve the uniformity of the cleaning process, increase the cleaning rate, reduce recombination of reactive species and increase the residence time of reactive species provided to the processing chamber.

Claims

1. A method of cleaning from a processing chamber deposits formed on interior surfaces of the processing chamber wherein said processing chamber interior surfaces include a first region and a second region said second region being different from said first region, said method comprising the steps of:

(a) dissociating a gas mixture outside said processing chamber to form reactive species, said gas mixture comprising an inert gas and a cleaning gas;

(b) providing said reactive species to said processing chamber;

(c) reacting said reactive species with said deposits in said processing chamber first region;

(d) forming volatile compounds from said deposits formed in said processing chamber first region;

(e) removing from said processing chamber said volatile compounds formed from deposits formed in said processing chamber first region;

(f) increasing the fluid communication between said processing chamber first and second regions;

(g) reacting said reactive species with said deposits in said processing chamber second region;

(h) forming volatile compounds from said deposits formed in said processing chamber second region; and

(i) removing from said processing chamber said volatile compounds formed from deposits formed in said processing chamber second region.

2. The method according to claim 1 wherein the ratio of said inert gas to said cleaning gas is about 2 to 1.

3. The method according to claim 1 wherein said step of dissociating a gas mixture outside said processing chamber to form reactive species is conducted in a microwave powered remote plasma apparatus.

4. The method of claim 1 wherein said step of reacting said reactive species with deposits formed in said processing chamber first region is performed at a first pressure and said step of reacting said reactive species with deposits formed in said processing chamber second region is performed at a second pressure wherein said second pressure is different from said first pressure.

5. The method of claim 2 wherein said first gas is an inert gas and said second gas is a halogenated gas.

6. The method of claim 5 wherein said halogenated gas is NF₃.

7. The method according to claim 3 wherein said microwave power causes more than 99% dissociation of said cleaning gas within said gas mixture.

8. The method of claim 4 wherein said first pressure is greater than said second pressure.

9. The method of claim 4 wherein said first pressure is about twice the second pressure.

10. The method of claim 4 wherein said first pressure is about 2 Torr.

11. A method of removing deposits formed in a processing chamber as a result of deposition operations performed on a substrate disposed within the processing chamber, the method comprising the steps of:

(a) activating a cleaning gas in a remote chamber separate from said processing chamber to form reactive species from said cleaning gas;

(b) providing an inert gas which mixes with said reactive species to form a gas mixture comprising reactive species;

(c) providing said gas mixture to said processing chamber while maintaining said processing chamber at a first pressure;

(d) while maintaining said processing chamber at said first pressure, reacting said reactive species with said deposits to form volatile compounds and thereafter removing from said processing chamber said volatile compounds formed at said first pressure;

(e) providing said gas mixture comprising reactive species to said processing chamber while maintaining said processing chamber at a second pressure that is different from said first pressure;

(f) while maintaining said processing chamber at said second pressure, reacting said reactive species with said deposits to form volatile compounds and thereafter removing from said processing chamber said volatile compounds formed at said second pressure; and

(g) conducting processing operations in said processing chamber to form a film on interior surfaces of said processing chamber without a substrate disposed within said chamber.

12. A method according to claim 11 wherein said second pressure is lower than said first pressure.

13. A method according to claim 11 wherein said second pressure is about half of said first pressure.

14. A method according to claim 11 wherein the step of providing an inert gas which mixes with said reactive species to form a gas mixture comprising reactive species further comprises an inert gas flow rate that is twice the flow rate of the cleaning gas used to form reactive species.

15. A method according to claim 11 further comprising the step of providing said gas mixture comprising reactive species to a first processing region of said processing chamber while maintaining said first pressure and providing said gas mixture comprising reactive species to a second processing region different from said first processing region while maintaining said second pressure in said processing chamber.

16. A method of removing deposits comprising Tantalum formed on interior surfaces of a processing chamber as a result of substrate processing operations conducted to deposit a film comprising Tantalum on a substrate, said processing chamber comprising a first processing region and a second processing region different from said first processing region, the method comprising the steps of:

(a) initiating a plasma in a remote chamber outside of said processing chamber;

(b) activating said cleaning gas with said plasma to generate reactive species from said cleaning gas;

(c) providing an inert gas that mixes with said reactive species forming a gas mixture comprising inert gas and reactive species;

(d) providing said gas mixture to the first processing region within said processing chamber;

(e) while maintaining said processing chamber at a first pressure, reacting said reactive species with said film comprising Tantalum within said first processing region to form volatile compounds;

(f) removing said volatile compounds formed within said first processing region from said processing chamber;

(g) increasing the fluid communication between said first and said second processing regions;

(h) providing said gas mixture to a second processing region within said processing chamber;

(i) while maintaining said processing chamber at a second pressure, reacting said reactive species with said film comprising Tantalum within said second processing region to form volatile compounds; and

(j) removing said volatile compounds formed within said second processing region from said processing chamber.

17. The method according to claim 16 comprising the further step following step (j) of conducting processing operations in said processing chamber without a substrate present in said chamber to form a film comprising Tantalum on interior surfaces of said processing chamber wherein said processing operations are conducted after removing from said processing chamber said volatile compounds formed from said first and second processing regions.

18. The method according to claim 16 wherein said cleaning gas is a halogen.

19. The method according to claim 16 wherein said cleaning gas comprises fluorine.

20. The method according to claim 16 wherein said cleaning gas is NF₃.

21. The method according to claim 16 wherein said inert gas is selected from the group consisting of Ar, Xe, Ne, He, and N₂.