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Method and apparatus for monitoring plasma processing operations

  • US 6,275,740 B1
  • Filed: 04/23/1998
  • Issued: 08/14/2001
  • Est. Priority Date: 04/23/1998
  • Status: Expired due to Fees
First Claim
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1. A method for running a plasma process on product in a processing chamber using a computer-readable storage medium, said computer-readable storage medium comprising a plurality of data entries, wherein a first said data entry comprises a plurality of optical emissions data segments of plasma from a first said plasma process previously run on product in said processing chamber which had proceeded in accordance with a first standard, wherein a second said data entry comprises a plurality of optical emissions data segments of plasma from a second said plasma process previously run on product in said processing chamber which had proceeded in accordance with a second standard, said first said plasma process being a different type than said second said plasma process, said method comprising the steps of:

  • loading a quantity of product into said processing chamber;

    running a third said plasma process on said product in said processing chamber;

    obtaining optical emissions data on said third said plasma process; and

    determining if said third said plasma process is a same type as one of said first and second said plasma processes, said determining step using said obtaining step, being executed during said running a third said plasma process step, and including comparing said optical emissions data from said third said plasma process with said optical emissions data segments of at least one of said first and second said data entries.

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