Spine distraction implant and method
First Claim
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1. A method of relieving pain associated with the spine comprising the steps of:
- introducing a device relative to a spinous process and another spinous process, wherein said device has a first configuration and a second configuration, and the introducing step includes introducing the device in the first configuration;
allowing the device to reconfigure to the second configuration in order to distract apart the spinous processes; and
said allowing step allows the device to reconfigure about one of the spinous process and the another spinous process.
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Abstract
A spine distraction implant alleviates pain associated with spinal stenosis and facet arthropathy by expanding the volume in the spine canal and/or neural foramen. The implant provides a spinal extension stop while allowing freedom of spinal flexion.
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Citations
10 Claims
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1. A method of relieving pain associated with the spine comprising the steps of:
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introducing a device relative to a spinous process and another spinous process, wherein said device has a first configuration and a second configuration, and the introducing step includes introducing the device in the first configuration;
allowing the device to reconfigure to the second configuration in order to distract apart the spinous processes; and
said allowing step allows the device to reconfigure about one of the spinous process and the another spinous process. - View Dependent Claims (2, 3, 4, 5)
using an introduction tool in order to introduce the device relative to the spinous process and the another spinous process in the first configuration; and
removing the introduction tool in order to allow the device to reconfigure to the second configuration.
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3. The method of claim 2 including:
said removing step allow the device to reconfigure about one of said spinous process and said another spinous process.
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4. The method of claim 1 wherein:
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prior to said introducing step is the step of causing the device to come to a first temperature associated with the first configuration; and
said allowing step allows the device to come to a second temperature when placed relative to the spinous process and the another spinous process in order that the device reconfigures to the second configuration.
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5. The method of claim 1 including:
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said introducing step including introducing an elongated implant, having an elongated first configuration, relative to a spinous process; and
allowing said elongated implant to curl about a spinous process when assuming the second configuration.
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6. An improved method for stabilizing a spinous process relative to another spinous process, said method being of the type wherein a device is implanted between said spinous process and said another spinous process, wherein said improvement comprises:
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introducing between said spinous process and said another spinous process a device which is comprised of a shape memory material and which device is formed in an introduction shape; and
allowing the device to assume a final implanted shape between said spinous process and said another spinous process in order to distract apart the spinous process. - View Dependent Claims (7, 8, 9, 10)
said introducing step includes using a material which changes shape according to temperature.
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8. The method of claim 6 including:
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using an introduction tool in order to introduce the device between the spinous process and the another spinous process in the first configuration; and
removing the introduction tool in order to allow the device to reconfigure to the second configuration.
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9. The method of claim 6 wherein:
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prior to said introducing step is the step of causing the device to come to a first temperature associated with the first configuration; and
said allowing step allows the device to come to a second temperature when placed between the spinous process and the another spinous process in order that the device reconfigures to the second configuration.
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10. The method of claim 6 including:
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said introducing step including introducing an elongated implant, having an elongated first configuration, relative to a spinous process; and
allowing said elongated implant to curl up between the spinous process when assuming the second configuration.
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Specification