×

Methods for preparing ruthenium oxide films

  • US 6,281,125 B1
  • Filed: 05/17/2000
  • Issued: 08/28/2001
  • Est. Priority Date: 08/27/1998
  • Status: Expired due to Term
First Claim
Patent Images

1. A method of manufacturing a semiconductor structure, the method comprising:

  • providing a semiconductor substrate or substrate assembly;

    providing a liquid precursor composition comprising one or more compounds of the formula;

View all claims
  • 9 Assignments
Timeline View
Assignment View
    ×
    ×