Corrosion-resistant polishing pad conditioner

• US 6,281,129 B1
• Filed: 09/20/1999
• Issued: 08/28/2001
• Est. Priority Date: 09/20/1999
• Status: Expired due to Term
• 

• Current Assignee: Bell Semiconductor, LLC (Hilco Inc. (d/b/a Hilco Global))
• Original Assignee: Agere Systems Guardian Corp. (Broadcom, Inc.)
• Inventors: Merchant, Sailesh M., Easter, William G., Maze, John A.
• Primary Examiner(s): Utech, Benjamin L.
• Assistant Examiner(s): DEO, DUY VU NGUYEN
• Application Number:
  US09/399,621
• Time in Patent Office: 708 Days
• Field of Search: 438/691, 438/692, 438/693, 451/56, 451/72, 451/910, 427/249.8, 427/249.11, 427/249.12
• US Class Current: 438/691
• CPC Class Codes: B24B 53/017 Devices or means for dressing, cleaning or otherwise conditioning lapping tools
• CPC Class Codes: B24B 53/12 Dressing tools; Holders therefor
• CPC Class Codes: B24D 3/06 metallic or mixture of metals with ceramic materials, e.g. hard metals, "cermets", cements

Abstract

The present invention provides a method of manufacturing a semiconductor device using a polishing apparatus having a polishing pad conditioning wheel. In one embodiment, the polishing pad conditioning wheel comprises a conditioning head, a setting alloy, an abrasive material, and a corrosion resistant coating. The conditioning head has opposing first and second faces with the first face being coupleable to the polishing apparatus. The setting alloy is coupled to the conditioning head at the second face, and the abrasive material is embedded in the setting alloy, which is substantially covered by the corrosion resistant coating.

Claims

1. A method of manufacturing a semiconductor device, comprising:

polishing a semiconductor wafer with a chemical/mechanical slurry against a polishing pad, the polishing forming variations in a polishing surface of the polishing pad; and

conditioning the polishing surface with a polishing pad conditioning wheel comprising;

a conditioning head having opposing first and second faces, the first face coupleable to a polishing apparatus;

a setting alloy coupled to the conditioning head at the second face;

abrasive material embedded in the setting alloy; and

a corrosion resistant coating affixed to the setting alloy.

2. The method as recited in claim 1 wherein conditioning includes conditioning with a polishing pad conditioning wheel wherein the corrosion resistant coating comprises a chromium/aluminum/yttrium alloy.

3. The method as recited in claim 2 wherein conditioning includes conditioning with a polishing pad conditioning wheel wherein the chromium/aluminum/yttrium alloy comprises a nickel/chromium/aluminum/yttrium alloy.

4. The method as recited in claim 2 wherein conditioning includes conditioning with a polishing pad conditioning wheel wherein the chromium/aluminum/yttrium alloy comprises a cobalt/chromium/aluminum/yttrium alloy.

5. The method as recited in claim 1 wherein conditioning includes conditioning with a polishing pad conditioning wheel wherein the setting alloy comprises a hard facing metal alloy.

6. The method as recited in claim 5 wherein conditioning includes conditioning with a polishing pad conditioning wheel wherein the setting alloy comprises a nickel/chromium/iron alloy.

7. The method as recited in claim 5 wherein conditioning includes conditioning with a polishing pad conditioning wheel wherein the hard facing metal alloy is selected from the group consisting of:

Inconel®

718,

Inconel®

718 LC,

Hastelloy®

,

Illium-R®

,

309 Stainless Steel,

347 Stainless Steel,

430 Stainless Steel, and

18-8 Stainless Steel.

8. The method as recited in claim 1 wherein conditioning includes conditioning with an abrasive material comprising diamonds.

9. A method for manufacturing an integrated circuit, comprising:

forming active devices on a semiconductor wafer and forming a substrate over the active devices;

positioning a semiconductor wafer in a polishing apparatus having a polishing surface, the polishing surface having been conditioned with a polishing pad conditioning wheel comprising;

a conditioning head having opposing first and second faces, the first face coupleable to the polishing apparatus;

a setting alloy coupled to the conditioning head at the second face;

abrasive material embedded in the setting alloy; and

a corrosion resistant coating affixed to the setting alloy; and

polishing the substrate against the polishing surface using the slurry.