Liquid crystal display having high aperture ratio and high transmittance and method of manufacturing the same
First Claim
1. A method of manufacturing a liquid crystal display having high aperture ratio and high transmittance comprising the steps of:
- forming a gate bus line and a common signal line on a lower substrate;
forming a gate insulating layer on the lower substrate in which the gate bus line and the common signal line are formed;
forming a channel layer on a selected portion of the gate insulating layer comprising the gate bus line;
forming a source and a drain electrodes so as to overlap with both sides of the channel layer, and a data bus line being arranged perpendicular to the gate bus line;
etching the gate insulating layer so as to expose a selected portion of the common signal line;
forming a counter electrode by depositing an ITO layer on the gate insulating layer, and by patterning a selected portion thereof so as to contact with the exposed common signal line;
depositing a passivation layer over the gate insulating layer in which the counter electrode is formed;
etching the passivation layer so as to expose a selected portion of the drain electrode; and
forming a pixel electrode, by depositing the ITO layer on the passivation layer so as to contact to the exposed drain electrode, and by patterning a selected portion of the ITO layer so that a fringe field is formed by being overlapped with the counter electrode.
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Accused Products
Abstract
The present invention provides a liquid crystal display having high aperture ratio and high transmittance, which prevents signal delay in the gate bus line and also improves the intensity of fringe field, and the method of manufacturing the same. The liquid crystal display is manufactured according to the steps of: forming a gate bus line and a common signal line on a lower substrate; forming a gate insulating layer on the lower substrate in which the gate bus line and the common signal line are formed; forming a channel layer on a selected portion of the gate insulating layer comprising the gate bus line; forming a source and a drain electrodes so as to overlap with both sides of the channel layer, and a data bus line being arranged perpendicular to the gate bus line; etching the gate insulating layer so as to expose a selected portion of the common signal line; forming a counter electrode by depositing an ITO layer on the gate insulating layer, and by patterning a selected portion thereof so as to contact with the exposed common signal line; depositing a passivation layer over the gate insulating layer in which the counter electrode is formed; etching the passivation layer so as to expose a selected portion of the drain electrode; and forming a pixel electrode, by depositing the ITO layer on the passivation layer so as to contact to the exposed drain electrode, and by patterning a selected portion of the ITO layer so that a fringe field is formed by being overlapped with the counter electrode.
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Citations
15 Claims
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1. A method of manufacturing a liquid crystal display having high aperture ratio and high transmittance comprising the steps of:
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forming a gate bus line and a common signal line on a lower substrate;
forming a gate insulating layer on the lower substrate in which the gate bus line and the common signal line are formed;
forming a channel layer on a selected portion of the gate insulating layer comprising the gate bus line;
forming a source and a drain electrodes so as to overlap with both sides of the channel layer, and a data bus line being arranged perpendicular to the gate bus line;
etching the gate insulating layer so as to expose a selected portion of the common signal line;
forming a counter electrode by depositing an ITO layer on the gate insulating layer, and by patterning a selected portion thereof so as to contact with the exposed common signal line;
depositing a passivation layer over the gate insulating layer in which the counter electrode is formed;
etching the passivation layer so as to expose a selected portion of the drain electrode; and
forming a pixel electrode, by depositing the ITO layer on the passivation layer so as to contact to the exposed drain electrode, and by patterning a selected portion of the ITO layer so that a fringe field is formed by being overlapped with the counter electrode. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A liquid crystal display having high aperture ratio and high transmittance comprising:
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a gate bus line and a common signal line, both disposed on a surface of a lower substrate;
a gate insulating layer coated over the lower substrate in which the gate bus line and the common signal line are formed;
a thin film transistor formed on a selected portion of the gate bus line;
a counter electrode contacted with the common signal line, disposed at a selected portion on the gate insulating layer and made of an ITO material;
a passivation layer formed on the gate insulating layer so as to cover the thin film transistor and the counter electrode; and
a pixel electrode contacted with a selected portion of the thin film transistor, formed on the passivation layer so as to overlap with the counter electrode, and making a fringe field together with the counter electrode and made of the ITO material. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15)
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Specification