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Method for producing co-planar surface structures

  • US 6,284,560 B1
  • Filed: 12/18/1998
  • Issued: 09/04/2001
  • Est. Priority Date: 12/18/1998
  • Status: Expired due to Term
First Claim
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1. A method for producing co-planar surface areas for micro-electromechanical systems structures comprising the steps of:

  • a) providing a first layer with at least two recesses over a substrate;

    b) depositing a second layer over the entire area of the first layer wherein the second layer has a thickness greater than the depth of the recesses and is composed of a differing material to the first layer;

    c) removing the second layer completely beyond the area of at least one recess;

    d) removing the remaining portion of the second layer until the second layer is coplanar with the first layer; and

    e) repeating step b) trough d) with differing material until all the recesses provided by the first layer are coplanar with the first layer fro producing co-planar areas for micro-electromechanical systems structures.

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