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Highly charged ion secondary ion mass spectroscopy

  • US 6,291,820 B1
  • Filed: 01/08/1999
  • Issued: 09/18/2001
  • Est. Priority Date: 01/08/1999
  • Status: Expired due to Fees
First Claim
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1. A secondary ion mass spectrometer system, comprising:

  • a beam source comprising an electron beam ion trap for producing a primary ion beam of highly charged ions, wherein the beam is directed at a target surface to cause emission of sputtered secondary ions and electrons, from the target surface;

    a mass analyzer into which are introduced the sputtered secondary ions; and

    a detector of the charged particles, wherein the sputtered secondary ions are detected in coincidence with a start signal and a selected secondary ion.

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