Highly charged ion secondary ion mass spectroscopy
First Claim
1. A secondary ion mass spectrometer system, comprising:
- a beam source comprising an electron beam ion trap for producing a primary ion beam of highly charged ions, wherein the beam is directed at a target surface to cause emission of sputtered secondary ions and electrons, from the target surface;
a mass analyzer into which are introduced the sputtered secondary ions; and
a detector of the charged particles, wherein the sputtered secondary ions are detected in coincidence with a start signal and a selected secondary ion.
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Abstract
A secondary ion mass spectrometer using slow, highly charged ions produced in an electron beam ion trap permits ultra-sensitive surface analysis and high spatial resolution simultaneously. The spectrometer comprises an ion source producing a primary ion beam of highly charged ions that are directed at a target surface, a mass analyzer, and a microchannel plate detector of secondary ions that are sputtered from the target surface after interaction with the primary beam. The unusually high secondary ion yield permits the use of coincidence counting, in which the secondary ion stops are detected in coincidence with a particular secondary ion. The association of specific molecular species can be correlated. The unique multiple secondary nature of the highly charged ion interaction enables this new analytical technique.
29 Citations
3 Claims
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1. A secondary ion mass spectrometer system, comprising:
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a beam source comprising an electron beam ion trap for producing a primary ion beam of highly charged ions, wherein the beam is directed at a target surface to cause emission of sputtered secondary ions and electrons, from the target surface;
a mass analyzer into which are introduced the sputtered secondary ions; and
a detector of the charged particles, wherein the sputtered secondary ions are detected in coincidence with a start signal and a selected secondary ion. - View Dependent Claims (2, 3)
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Specification