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Electro-magnetic lithographic alignment method

  • US 6,294,909 B1
  • Filed: 06/07/1995
  • Issued: 09/25/2001
  • Est. Priority Date: 04/08/1992
  • Status: Expired due to Term
First Claim
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1. A method of aligning a membrane lithographic fabrication tool comprising a low-stress deposited dielectric layer to a semiconductor substrate to be exposed by the tool, comprising the steps of:

  • providing a first conductive coil pattern on a surface of the semiconductor substrate;

    applying electrical current to the first coil pattern;

    providing a second conductive coil on a surface of the tool capable of sensing an electro-magnetic field;

    sensing an electro-magnetic field generated by the first coil in the second coil; and

    aligning the tool according to the signal sensed by the second coil.

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