Method for making a thin film of solid material
First Claim
1. A method of manufacturing a thin film of solid material that includes at least the following steps:
- a step of ionic implantation through one face of a substrate of the solid material using ions capable of creating in the volume of the substrate, and at a depth close to the mean depth of penetration of the ions, a layer of micro-cavities or micro-bubbles, this step being carried out at a maximum implantation temperature for a length of time;
an annealing step to bring the layer of micro-cavities or micro-bubbles to a maximum annealing temperature for a length of time; and
a step of selecting a thermal budget of the annealing step so that the thermal budget for the annealing step is greater than or equal to a minimum total thermal budget necessary to obtain cleavage of the substrate along the layer of micro-cavities or micro-bubbles less a thermal budget for the step of ionic implantation less the sum of any thermal budgets inferred by steps other than the step of ionic implantation and the annealing step.
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Abstract
The invention relates to a method of manufacturing a thin film of solid material comprising at least the following steps:
a step of ionic implantation through one face of a substrate of said solid materials using ions capable of creating in the volume of the substrate and at a depth close to the mean depth of penetration of the ions, a layer of micro-cavities or micro-bubbles, this step being carried out at a particular temperature and for a particular length of time,
an annealing step intended to bring the layer of micro-cavities or micro-bubbles to a particular temperature and for a particular length of time with the intention of obtaining cleavage of the substrate on both sides of the layer of micro-cavities or micro-bubbles.
The annealing step is carried out to a thermal budget made in relation to the thermal budget of the ionic implantation step and possibly other thermal budgets inferred for other steps, in order to provide said cleavage of the substrate.
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Citations
19 Claims
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1. A method of manufacturing a thin film of solid material that includes at least the following steps:
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a step of ionic implantation through one face of a substrate of the solid material using ions capable of creating in the volume of the substrate, and at a depth close to the mean depth of penetration of the ions, a layer of micro-cavities or micro-bubbles, this step being carried out at a maximum implantation temperature for a length of time;
an annealing step to bring the layer of micro-cavities or micro-bubbles to a maximum annealing temperature for a length of time; and
a step of selecting a thermal budget of the annealing step so that the thermal budget for the annealing step is greater than or equal to a minimum total thermal budget necessary to obtain cleavage of the substrate along the layer of micro-cavities or micro-bubbles less a thermal budget for the step of ionic implantation less the sum of any thermal budgets inferred by steps other than the step of ionic implantation and the annealing step. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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Specification