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High-density plasma for ionized metal deposition capable of exciting a plasma wave

  • US 6,306,265 B1
  • Filed: 04/11/2000
  • Issued: 10/23/2001
  • Est. Priority Date: 02/12/1999
  • Status: Expired due to Term
First Claim
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1. A magnetron assembly positionable at a backside of a sputtering target and rotatable about a center position of said target, comprising a single magnetron asymmetrically disposed about said center position and including:

  • a first pole of a first magnetic polarity comprising first magnets of a first magnetic polarity arranged in a triangular shape, at least two of said first magnets being bar magnets arranged on long sides of said triangular shape and being inclined to each other by between 10° and

    35°

    ; and

    a second pole of a second magnetic polarity disposed inside of said triangular shape and separated from said first magnets by a gap extending along a surface of said target.

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