Zoom illumination system for use in photolithography

• US 6,307,682 B1
• Filed: 02/16/2000
• Issued: 10/23/2001
• Est. Priority Date: 02/16/2000
• Status: Expired due to Fees

• Current Assignee: ASML Holding NV, ASML US Incorporated (ASML Holding NV), ASML US, LLC (ASML Holding NV)
• Original Assignee: Silicon Valley Group, Inc. (ASML Holding NV)
• Inventors: Hoffman, Jeffrey M., Ryzhikov, Lev, Oskotsky, Mark, Kunick, Joseph M.
• Primary Examiner(s): Sugarman, Scott J.
• Application Number:
  US09/504,719
• Time in Patent Office: 615 Days
• Field of Search: 359/618, 359/619, 359/663, 359/676
• US Class Current: 359/663
• CPC Class Codes: G02B 3/005 arranged along a single direction only, e.g. lenticular sheets G02B3/0043 takes precedence
• CPC Class Codes: G03F 7/70075 Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
• CPC Class Codes: G03F 7/70183 Zoom systems for adjusting beam diameter

Abstract

The present invention provides an illumination system for varying the size of an illumination field incident to a scattering optical element. The illumination field is subsequently imaged to a reticle in a photolithographic process. The illumination system includes, in series along an optical axis of the illumination system, an optical source, a beam conditioner, a first optical integrator, a first or input collimating lens, a zoom array integrator (ZAI), a second or output collimating lens, the optical scattering element, a relay lens, and the reticle. The ZAI includes an assembly of fixed and moveable lens components arranged to vary the size of the illumination field throughout a zoom range of the ZAI while maintaining telecentric illumination at a substantially fixed numerical aperture. Illumination telecentricity and substantially fixed numerical apertures are maintained at both the scattering optical element and the reticle throughout the zoom range.

Claims

1. An illumination system for photolithography, comprising:

an illumination source and an optical integrator that together produce a plurality of incident source images;

a condenser that receives a plurality of incident beams from the plurality of incident source images and forms an illumination field at an illumination plane using the incident beams, the condenser including a Zoom Array Integrator (ZAI) having fixed and movable lens components arranged to controllably vary a size of the illumination field throughout a zoom range of the ZAI and to maintain telecentric illumination at a substantially fixed numerical aperture at the illumination plane throughout the zoom range, whereby the illumination field is scattered by an optical element and then telecentrically imaged to a reticle with a substantially fixed reticle numerical aperture at the reticle throughout the zoom range.

2. The system of claim 1, wherein the ZAI has a variable focal length and wherein the size of the illumination field at the illumination plane varies proportionally with the focal length as the focal length is zoomed.

3. The system of claim 1, wherein the ZAI has a focal length in a Y-direction that varies as the moveable lens arrays are moved throughout the zoom range, whereby the size of the illumination field correspondingly varies in the Y-direction throughout the zoom range.

4. The system of claim 3, wherein the ZAI has a fixed focal length in an X-direction orthogonal to the Y-direction throughout the zoom range, whereby the size of the illumination field is correspondingly fixed in the X-direction throughout the zoom range.

5. The system of claim 1, wherein the fixed and moveable lens arrays of the ZAI produce an array of source images coinciding with an image plane at an output of the ZAI, the array of source images covering a predetermined area that determines the numerical aperture of the illumination field, the predetermined area covered by the source images and correspondingly the numerical aperture at the illumination field remaining substantially fixed throughout the zoom range of the ZAI.

6. The system of claim 1, wherein the fixed and moveable lens arrays of the ZAI produce a plurality of emergent beams having an angular distribution converging at an image plane at an output of the ZAI to thereby form a corresponding array of source images coinciding with the image plane, the angular distribution of the emergent beams determining the size of the illumination field at the illumination plane, whereby movement of the moveable lens arrays causes the angular distribution and correspondingly the size of the illumination field to vary throughout the zoom range of the ZAI.

7. The system of claim 6, wherein the plurality of emergent beams and correspondingly the illumination field maintain telecentricity when the moveable lens arrays are moved throughout the zoom range of the ZAI.

8. The system of claim 1, wherein the fixed and moveable lens arrays of the ZAI produce a plurality of emergent beams having a telecentric angular distribution converging at an output focal plane of the ZAI to thereby form a corresponding array of telecentric source images coinciding with an image plane at an output of the ZAI, the image plane and the array of source images having a predetermined fixed position along an optical axis of the illumination system throughout the zoom range of the ZAI, to thereby maintain telecentricity of the illumination field throughout the zoom range.

9. The system of claim 8, wherein the condenser includes a collimating lens, positioned between the ZAI and the illumination plane, that collimates the emergent beams from the ZAI and produces the telecentric illumination field at the illumination plane.

10. The system of claim 9, wherein the collimating lens is positioned along the optical axis such that a front focal plane of the collimating lens coincides with the output focal plane of the ZAI.

11. The system of claim 1, further including a beam conditioner positioned, between the illumination source and the optical integrator, that produces a collimated optical beam having a predetermined cross-section.

12. The system of claim 1, wherein the fixed and moveable lens arrays of the ZAI form a plurality of independent optical channels, each of the optical channels forming a sub-image of the incident source images at an image plane at an output of the ZAI, the sub-images collectively forming an array of sub-images covering a predetermined area that determines the numerical aperture of the illumination field, the predetermined area and correspondingly the numerical aperture remaining substantially fixed as the size of the illumination field is varied throughout the zoom range of the ZAI.

13. The system of claim 12, wherein each sub-image covers a sub-area that varies throughout the zoom range of the ZAI while a centroid region of each sub-image occupies a predetermined fixed position in the array of sub-images throughout the zoom range, whereby a variation in the numerical aperture at the illumination field is limited to a proportional variation of the sub-area relative to the predetermined area covered by the array of sub-images.

14. The system of claim 1, wherein the ZAI includes a fixed input lens array and a fixed output lens array spaced apart from the input lens array along an optical axis of the ZAI.

15. The system of claim 14, wherein each of the fixed input and output lens arrays includes a one-dimensional array of elongate lens elements lying in an X-Y plane, each of the lens elements having a refractive power in an X-direction.

16. The system of claim 15, wherein each of the fixed input and output lens arrays has the same focal length in the X-direction, the fixed output lens array being positioned to coincide with an output focal plane of the fixed input lens array in a fly'"'"'s eye configuration, the fixed input and output lens arrays forming a fixed focal length of the ZAI in the X-direction.

17. The system of claim 1, wherein the ZAI includes a plurality of moveable lens arrays that are moveable along an optical axis of the ZAI to zoom a focal length of the ZAI and correspondingly vary the size of the illumination field throughout the zoom range.

18. The system of claim 17, wherein each of the moveable lens arrays includes a one-dimensional array of elongate lens elements lying in an X-Y plane, each of the lens elements having a refractive power in a Y-direction, whereby movement of the moveable lens arrays along an optical axis of the ZAI parallel with a Z-direction varies a focal length and correspondingly the size of the illumination field in the Y-direction.

19. The system of claim 17, wherein the plurality of moveable lens arrays includes three lens arrays that are moved relative to the each other to controllably vary the size of the field of illumination throughout the zoom range and to maintain the telecentric illumination at the substantially fixed numerical aperture throughout the zoom range while maintaining a fixed focus position.

20. The system of claim 18, wherein the moveable lens arrays are positioned between fixed input and output lens arrays having refractive power in an X-direction.

21. The system of claim 18, wherein the ZAI further includes a fixed lens array positioned at an aperture stop of the ZAI to receive light incident to the ZAI over a field-of-view and to prevent under- and over-filling light conditions in the ZAI.

22. A Zoom Array Integrator (ZAI) for providing an illumination field useable in a photolithographic system, comprising:

at least one fixed lens component; and

a plurality of moveable lens components, wherein the fixed and moveable lens components are arranged to controllably vary a size of the illumination field throughout a zoom range of the ZAI and to maintain telecentric illumination at a substantially fixed numerical aperture at the illumination field throughout the zoom range, whereby the illumination field is scattered by an optical element and then telecentrically imaged to a reticle with a substantially fixed reticle numerical aperture at the reticle throughout the zoom range.

23. A Zoomable Array Integrator (ZAI) for providing an illumination field useable in a photolithographic system, comprising, in series along an optical axis of the ZAI:

a fixed first X lens array having optical power in an X-direction;

a fixed first Y lens array having optical power in a Y-direction perpendicular to the X-direction;

a moveable second Y lens array having optical power in the Y-direction;

a fixed second X-array; and

a moveable third Y lens array, wherein the moveable second and third Y-arrays are moved along the optical axis to vary a size of the illumination field without a loss of optical energy at the illumination field.

24. The ZAI of claim 23, wherein the Y-arrays are arranged in accordance with a Manhattan structure.