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Use of glass laminate as a substrate in semiconductor devices

  • US 6,309,901 B1
  • Filed: 04/18/2000
  • Issued: 10/30/2001
  • Est. Priority Date: 10/24/1997
  • Status: Expired due to Term
First Claim
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1. Method for making a semiconductor device comprising the step of applying a functional layer on a substrate, optionally provided with an intermediate layer, wherein said substrate is a laminate which comprises a support and a glass layer, said glass layer having a thickness of less than 700 μ

  • m.

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