Use of glass laminate as a substrate in semiconductor devices
First Claim
1. Method for making a semiconductor device comprising the step of applying a functional layer on a substrate, optionally provided with an intermediate layer, wherein said substrate is a laminate which comprises a support and a glass layer, said glass layer having a thickness of less than 700 μ
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Abstract
A method for making a semiconductor device is disclosed which comprises the step of applying a functional layer on a substrate, characterized in that said substrate is a laminate which comprises a support and a glass layer, said glass layer having a thickness of less than 700 μm. The support is preferably a plastic foil. The laminate has the combined benefits of low weight and high strength and is therefore a suitable substrate for making flat panel displays such as liquid crystal displays, plasma displays, field emission displays or organic light-emitting polymer displays. Preferred examples of the functional layer are e.g. electroconductive layers, liquid crystal orientation layers, color filters, electroluminescent layers, passivation layers and phosphor layers.
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15 Claims
- 1. Method for making a semiconductor device comprising the step of applying a functional layer on a substrate, optionally provided with an intermediate layer, wherein said substrate is a laminate which comprises a support and a glass layer, said glass layer having a thickness of less than 700 μ
Specification