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Surface inspection apparatus and method

  • US 6,313,913 B1
  • Filed: 11/23/1999
  • Issued: 11/06/2001
  • Est. Priority Date: 11/26/1998
  • Status: Expired due to Fees
First Claim
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1. A liquid crystal display manufacturing method comprising:

  • inspecting a reticle having a pattern thereon for defects and foreign matter adhering to the reticle; and

    exposing a pattern of the reticle onto a photosensitive substrate;

    wherein said step of inspecting the reticle comprises;

    a. irradiating the reticle with a first light beam from a first light irradiation system to form a first band-shaped irradiation region along a predetermined first direction on the reticle;

    b. receiving scattered light from said first band-shaped irradiation region with a first light receiving system;

    c. irradiating the reticle with a second light beam from a second light irradiation system to form a second band-shaped irradiation region along said first direction on the reticle;

    d. receiving scattered light from said second band-shaped irradiation region with a second light receiving system; and

    e. moving the reticle relative to said first and second light irradiation systems along a second direction substantially orthogonal to said first direction;

    f. wherein said first band-shaped irradiation region and said second band-shaped irradiation region are separated by a predetermined distance along said second direction so as to prevent said first light irradiation system from receiving scattered light from said second band-shaped irradiation region and prevent said second light irradiation system from receiving scattered light from said first band-shaped irradiation region.

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