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Method of determining the doping concentration and defect profile across a surface of a processed semiconductor material

  • US 6,320,403 B1
  • Filed: 08/10/1998
  • Issued: 11/20/2001
  • Est. Priority Date: 08/10/1998
  • Status: Expired due to Fees
First Claim
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1. A method of determining a doping type and a doping concentration of a processed semiconductor material, comprising the steps of:

  • moving carriers in the material, wherein a number of carriers is a function of the doping concentration of the material and a type of carriers is a function of the doping type of the material;

    deflecting the carriers toward a surface of the material; and

    detecting an accumulated charge on the surface of the material due to the deflected carriers.

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