Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
First Claim
1. A gas stream treatment system for treating a gas stream from an upstream source, the gas stream including an oxidizable component comprising:
- an oxidation unit arranged to receive a gas stream including an oxidizable component from an upstream unit in the gas stream treatment system and impose oxidization conditions on the gas stream to reduce the oxidizable component thereof;
a pre-oxidation scrubber unit upstream of the oxidation unit and communicatively connected thereto for removing scrubbable components from the gas stream and discharging the gas stream to the oxidation unit;
a post-oxidation scrubber unit downstream of the oxidation unit and in fluid stream-receiving relationship thereto for receiving the gas stream from the oxidation unit to remove scrubbable components from the gas stream; and
an oxygen-containing gas source arranged communicatively connected to the gas stream treatment system to provide oxygen-containing gas for enhancement of reduction of the oxidizable component of the gas stream in the system.
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Accused Products
Abstract
An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises an oxidation unit to which an oxygen-containing gas such as ozone may be added, with input of energy (e.g., thermal, radio frequency, electrical, microwave, etc.), to effect oxidation of oxidizable species in the effluent, such as halocompounds (e.g., chlorofluorocarbons, perfluorocarbons), CO, NF3, nitrogen oxides, and sulfur oxides). The effluent gas stream treatment system may include a wet scrubber associated with the oxygen-containing gas source, so that the gas stream is contacted with the oxygen-containing gas during the wet scrubbing operation, to enhance removal of oxidizable species in the gas stream during treatment.
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Citations
35 Claims
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1. A gas stream treatment system for treating a gas stream from an upstream source, the gas stream including an oxidizable component comprising:
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an oxidation unit arranged to receive a gas stream including an oxidizable component from an upstream unit in the gas stream treatment system and impose oxidization conditions on the gas stream to reduce the oxidizable component thereof;
a pre-oxidation scrubber unit upstream of the oxidation unit and communicatively connected thereto for removing scrubbable components from the gas stream and discharging the gas stream to the oxidation unit;
a post-oxidation scrubber unit downstream of the oxidation unit and in fluid stream-receiving relationship thereto for receiving the gas stream from the oxidation unit to remove scrubbable components from the gas stream; and
an oxygen-containing gas source arranged communicatively connected to the gas stream treatment system to provide oxygen-containing gas for enhancement of reduction of the oxidizable component of the gas stream in the system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
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Specification