Opto-electronic shutter
First Claim
Patent Images
1. An optoelectronic shutter, comprising:
- an input plate and an output plate, comprising material substantially transparent to input and output radiation respectively, each plate having an outer and an inner surface, wherein a recess is formed in the inner surface of at least one of the plates, and wherein respective non-recessed portions of the inner surfaces of the plates are bonded together, and the recess defines a vacuum chamber enclosed by the two plates;
a photocathode, fixed to the inner surface of the input plate, adjacent the chamber;
a photoluminescent anode, fixed to the inner surface of the output plate, adjacent the chamber and opposite the photocathode; and
means for providing a potential difference between the photocathode and the anode.
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Abstract
An optoelectronic shutter for radiation, comprising an input plate and an output plate, comprising material substantially transparent to the radiation, each plate having an outer and an inner surface, wherein a recess is formed in the inner surface of at least one of the plates, and wherein respective non-recessed portions of the inner surfaces of the plates are bonded together, and the recess defines a vacuum chamber enclosed by the two plates; a photocathode fixed to the inner surface of the input plate, adjacent the chamber, and a photo-emissive anode, fixed to the inner surface of the output plate, adjacent the chamber and opposite the photocathode.
69 Citations
48 Claims
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1. An optoelectronic shutter, comprising:
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an input plate and an output plate, comprising material substantially transparent to input and output radiation respectively, each plate having an outer and an inner surface, wherein a recess is formed in the inner surface of at least one of the plates, and wherein respective non-recessed portions of the inner surfaces of the plates are bonded together, and the recess defines a vacuum chamber enclosed by the two plates;
a photocathode, fixed to the inner surface of the input plate, adjacent the chamber;
a photoluminescent anode, fixed to the inner surface of the output plate, adjacent the chamber and opposite the photocathode; and
means for providing a potential difference between the photocathode and the anode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39)
a first transparent, conductive coating on the inner surface of the input plate, between the plate and the photocathode;
a second transparent, conductive coating on the inner surface of the output plate, between the plate and the anode; and
a third transparent, conductive coating on the inner surface of the one of the input and output plates, intermediate the photocathode and the anode.
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24. A shutter according to claim 23, wherein the means for providing comprises first, second and third metal coatings on portions of the inner surfaces of the input and output plates, wherein the metal coatings are situated along the periphery of and electrically coupled to the first, second and third transparent conductive coatings, respectively.
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25. A shutter according to claim 24, and comprising an electrically insulating layer intermediate two of the metal coatings.
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26. A shutter according claim 22, wherein the means for providing a potential difference comprises electrical leads coupled to the transparent, conductive coatings.
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27. A shutter according to claim 22, wherein one of the input and output plates has a notch formed therein, the notch providing access to at least one of the coatings on the inner surface of one of the plates, and wherein one of the electrical leads is fastened to the coating exposed within the notch.
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28. A shutter according claim 1, wherein the anode is electrically negatively biased by said potential difference relative to the photocathode.
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29. A shutter according to claim 28, wherein the anode is biased relative to the photocathode by a biasing voltage substantially less than 1000 VDC.
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30. A shutter according to claim 29, wherein the biasing voltage is less than or equal to 500 VDC.
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31. A shutter according to claim 30, wherein the biasing voltage is substantially in the range 300-500 VDC.
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32. A shutter according to claim 1, wherein the overall thickness of the shutter, measured between the outer surfaces of the input and output plates, is substantially less than 20 mm.
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33. A shutter according to claim 32, wherein the overall thickness of the shutter is less than or equal to 10 mm.
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34. A shutter according to claim 33, wherein the overall thickness is substantially in the range 1-10 mm.
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35. A shutter according to claim 1, wherein the shape of the shutter, as defined by the shape of a clear aperture thereof, is substantially rectangular.
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36. A shutter according to claim 1, and comprising a getter inside the chamber.
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37. A shutter according to claim 1, wherein the output plate comprises a fiber optic face plate.
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38. A shutter according to claim 1, wherein the output plate is comprised of a non-conducting material.
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39. A shutter according to claim 1, wherein the input plate is comprised of a non-conducting material.
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8. An optoelectronic shutter for radiation, comprising:
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an input plate and an output plate, of material substantially transparent to the radiation, each plate having an outer and an inner surface, the plates defining and enclosing a vacuum chamber therebetween;
a photocathode, fixed to the inner surface of the input plate, adjacent the chamber;
a photoluminescent anode, fixed to the inner surface of the output plate, adjacent the chamber and opposite the photocathode; and
means for providing a potential difference between the photocathode and the anode;
wherein electrons emitted by the photocathode pass through the chamber and strike the anode, responsive to a trigger pulse applied to the shutter, the distance between the photocathode and the anode being such that the electrons strike the anode substantially without defocusing, wherein there are no electromagnetic fields, other than those providing said potential difference between the photocathode and the anode, applied to the shutter for the purpose of electron focusing, and wherein the shutter does not include a microchannel plate. - View Dependent Claims (9, 10, 11, 12)
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40. A method for producing an optoelectronic shutter for radiation, comprising:
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providing first and second plates of material substantially transparent to the radiation, each plate having a first and a second surface;
etching a recess in the first surface of at least one of the plates;
depositing photocathode material on the first surface of the first plate;
depositing photoluminescent anode material on the first surface of the second plate;
providing means for impressing an electric field between the photocathode and the anode; and
bonding the first surface of the first plate to the first surface of the second plate to form an evacuated chamber between the plates, which chamber comprises the recess;
wherein depending the photocathode and anode materials comprises depositing the materials over portions of the respective first surfaces of the plates that adjoin the chamber. - View Dependent Claims (41, 42, 43, 44, 45, 46, 47, 48)
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Specification