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Multi-layer sputter deposition apparatus

  • US 6,328,858 B1
  • Filed: 09/23/1999
  • Issued: 12/11/2001
  • Est. Priority Date: 10/01/1998
  • Status: Expired due to Term
First Claim
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1. A multi-layer sputter deposition chamber comprising:

  • a) a plurality of magnetrons mounted on a rotatable member, wherein a predetermined one of the plurality of magnetrons is positionable proximate to at least one substrate in the sputter deposition chamber;

    b) a transport mechanism that transports the at least one substrate proximate to the predetermined one of the plurality of magnetrons in a path of the sputtered ions in a first and a second direction that is substantially opposite to the first direction; and

    c) a substrate holder attached to the transport mechanism for supporting the at least one substrate.

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