Defect compensation method for semiconductor element
First Claim
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1. A defect compensation method for a semiconductor element to compensate defect of the semiconductor element, wherein hot water is contacted with semiconductor element to make the defect compensation of the semiconductor element.
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Abstract
A defect compensation method for a semiconductor element to compensate for defects of the semiconductor element, in which hot water is conducted with the semiconductor element to accomplish defect compensation. On the basis of this treatment, excessive progress of oxidation of the crystal grain boundary and retention of water and OH− groups in the film are provented.
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22 Claims
- 1. A defect compensation method for a semiconductor element to compensate defect of the semiconductor element, wherein hot water is contacted with semiconductor element to make the defect compensation of the semiconductor element.
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