Planar gas introducing unit of a CCP reactor

• US 6,333,601 B1
• Filed: 03/28/2000
• Issued: 12/25/2001
• Est. Priority Date: 05/19/1999
• Status: Expired due to Term

• Current Assignee: Anelva Corporation (Canon Inc.)
• Original Assignee: Anelva Corporation (Canon Inc.)
• Inventors: Wickramanayaka, Sunil
• Primary Examiner(s): Wong, Don
• Assistant Examiner(s): Alemu, Ephrem
• Application Number:
  US09/453,900
• Time in Patent Office: 637 Days
• Field of Search: 315/111.41, 315/111.21, 315/111.31, 315/111.71, 118/723.R, 118/723.ME, 118/723.MR, 118/723.MF, 118/723.DC, 118/723.ER, 118/723.IR, 156/345
• US Class Current: 315/111.41
• CPC Class Codes: H01J 37/32091 the radio frequency energy being capacitively coupled to the plasma
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/3266 Magnetic control means

Abstract

A planar gas introducing unit arranged within a capacitively coupled plasma (CCP) reactor includes a top electrode, a gas inlet plate having a plurality of gas inlet holes and a gas reservoir 20 formed between the top electrode and the gas inlet plate. The top electrode includes a plurality of magnets which are arranged such that the magnets operate to substantially prevent an enhanced erosion of the plurality of gas inlet holes. Each of the plurality of magnets can be arranged to correspond to a gas inlet hole such that an axis of each of the plurality of magnets is aligned with an axis of a corresponding gas inlet hole and magnetic fields emitted from the plurality of magnets pass through the gas inlet holes in a direction substantially corresponding to the axis of the corresponding gas inlet hole. The planar gas introducing unit of the present invention prevents plasma enhanced erosion generated at both ends of the gas inlet holes.

Claims

1. A planar gas introducing unit of a capacitively coupled plasma (CCP) reactor, the planar gas introducing unit comprising:

a gas inlet plate having a plurality of gas inlet holes;

a top electrode spaced from the gas inlet plate;

a gas reservoir formed between the top electrode and the gas inlet plate; and

wherein the top electrode includes a plurality of magnets arranged such that the plurality of magnets operate to substantially prevent an enhanced erosion of the plurality of gas inlet holes.

2. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 1, wherein the plurality of magnets are situated in a spaced relationship relative to one another on a surface of the top electrode and are arranged across from the plurality of gas inlet holes of the gas inlet plate.

3. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 2, wherein each of said plurality of magnets is arranged to correspond to a gas inlet hole such that an axis of each of said plurality of magnets is aligned with an axis of a corresponding gas inlet hole and magnetic fields emitted from said plurality of magnets pass through the gas inlet holes in a direction substantially corresponding to the axis of the corresponding gas inlet hole.

4. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 3, wherein the plurality of magnets are arranged in the top electrode such that a magnetic field emitted from one of said plurality of magnets does not influence a magnetic field emitted from another neighboring magnet of the plurality of magnets.

5. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 4, wherein each of the plurality of magnets has a magnetic pole having a polarity which is directed towards the gas inlet plate, the magnetic poles being arranged in a random order.

6. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 3, wherein the plurality of magnets are arranged in the top electrode such that a magnetic field emitted from one of said plurality of magnets is influenced by a magnetic field emitted from another neighboring magnet of the plurality of magnets.

7. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 6, wherein each of the plurality of magnets has a magnetic pole having a polarity which is directed towards the gas inlet plate, the magnetic poles being arranged having alternating polarities.

8. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 3, wherein the number of magnets is the same as the number of gas inlet holes.

9. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 1, wherein the plurality of magnets are arranged in holes formed in the surface of the top electrode.

10. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 1, wherein the top electrode is made of a nonmagnetizing metal.

11. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 10, wherein the nonmagnetizing metal is aluminum.

12. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 1, wherein the gas inlet plate is made of a conducting material.

13. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 12, wherein the conducting material is a material selected from the group consisting of aluminum, carbon and doped-Si.

14. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 1, wherein the gas inlet plate is made of a non-conducting material.

15. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 14, wherein the non-conducting material is quartz or ceramic.

16. A planar gas introducing unit of a capacitively coupled plasma (CCP) reactor, the planar gas introducing unit comprising:

a gas inlet plate having a plurality of gas inlet holes;

a top electrode spaced from the gas inlet plate;

a gas reservoir formed between the top electrode and the gas inlet plate; and

wherein the top electrode includes a plurality of magnets arranged such that magnetic fields emitted from said plurality of magnets pass through the gas inlet holes of the gas inlet plate.

17. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 16, wherein the plurality of magnets are situated in a spaced relationship relative to one another on a surface of the top electrode.

18. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 17, wherein the plurality of magnets are arranged in the top electrode such that a magnetic field emitted from one of said plurality of magnets does not influence a magnetic field emitted from another neighboring magnet of the plurality of magnets.

19. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 18, wherein each of the plurality of magnets has a magnetic pole having a polarity which is directed towards the gas inlet plate, the magnetic poles being arranged in a random order.

20. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 17, wherein the plurality of magnets are arranged in the top electrode such that a magnetic field emitted from one of said plurality of magnets is influenced by a magnetic field emitted from another neighboring magnet of the plurality of magnets.

21. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 20, wherein each of the plurality of magnets has a magnetic pole having a polarity which is directed towards the gas inlet plate, the magnetic poles being arranged having alternating polarities.

22. A planar gas introducing unit of a capacitively coupled plasma (CCP) reactor, the planar gas introducing unit comprising:

a gas inlet plate having a plurality of gas inlet holes;

a top electrode spaced from the gas inlet plate;

a gas reservoir formed between the top electrode and the gas inlet plate; and

wherein the top electrode includes a plurality of magnets which are arranged across from the plurality of gas inlet holes of the gas inlet plate and an axis of each of said plurality of magnets is aligned with an axis of a corresponding gas inlet hole.

23. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 22, wherein the plurality of magnets are situated in a spaced relationship relative to one another on a surface of the top electrode.

24. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 23, wherein the plurality of magnets are arranged in the top electrode such that a magnetic field emitted from one of said plurality of magnets does not influence a magnetic field emitted from another neighboring magnet of the plurality of magnets.

25. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 24, wherein each of the plurality of magnets has a magnetic pole having a polarity which is directed towards the gas inlet plate, the magnetic poles being arranged in a random order.

26. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 23, wherein the plurality of magnets are arranged in the top electrode such that a magnetic field emitted from one of said plurality of magnets is influenced by a magnetic field emitted from another neighboring magnet of the plurality of magnets.

27. The planar gas introducing unit of a capacitively coupled plasma reactor of claim 26, wherein each of the plurality of magnets has a magnetic pole having a polarity which is directed towards the gas inlet plate, the magnetic poles being arranged having alternating polarities.