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Low pressure vapor phase deposition of organic thin films

  • US 6,337,102 B1
  • Filed: 11/17/1997
  • Issued: 01/08/2002
  • Est. Priority Date: 11/17/1997
  • Status: Expired due to Term
First Claim
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1. A method for fabricating organic films comprising:

  • providing a first carrier gas stream;

    volatilizing a first organic small molecule material into the first carrier gas stream;

    passing the first carrier gas stream through an apparatus;

    maintaining the wall temperature of the apparatus at a sufficiently high temperature to avoid condensation of the volatilized first organic small molecule material;

    passing the first carrier gas stream at a pressure of about 0.001 torr to about 100 torr over a substrate; and

    depositing said first organic small molecule material on said substrate so as to form a first film comprising the first organic small molecule material on said substrate.

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