Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby

• US 6,337,292 B1
• Filed: 10/29/1999
• Issued: 01/08/2002
• Est. Priority Date: 10/29/1998
• Status: Expired due to Term

• Current Assignee: LG Display Co., Ltd.
• Original Assignee: LG Philips LCD Company Limited (LG Display Co., Ltd.)
• Inventors: Kim, Kwang Nam, Chae, Gee Sung
• Primary Examiner(s): Bowers, Charles
• Assistant Examiner(s): KILDAY, LISA A
• Application Number:
  US09/430,037
• Time in Patent Office: 802 Days
• Field of Search: 438/758, 438/787, 438/800, 438/931, 438/680, 438/689, 438/753, 438/757, 219/121.43, 219/121.44
• US Class Current: 438/787
• CPC Class Codes: C23C 16/402 Silicon dioxide
• CPC Class Codes: C23C 16/5096 Flat-bed apparatus
• CPC Class Codes: H01J 37/32082 Radio frequency generated discharge H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence
• CPC Class Codes: H01J 37/32165 Plural frequencies
• CPC Class Codes: H01J 37/32183 Matching circuits
• CPC Class Codes: H01L 21/02164 the material being a silicon oxide, e.g. SiO2
• CPC Class Codes: H01L 21/0217 the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz H01L21/02126 and H01L21/0214 take precedence
• CPC Class Codes: H01L 21/02211 the compound being a silane, e.g. disilane, methylsilane or chlorosilane
• CPC Class Codes: H01L 21/02274 in the presence of a plasma [PECVD]
• CPC Class Codes: H01L 21/0228 deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
• CPC Class Codes: H01L 21/31612 on a silicon body
• CPC Class Codes: H01L 29/66757 Lateral single gate single channel transistors with non-inverted structure, i.e. the channel layer is formed before the gate
• CPC Class Codes: Y10S 438/931 Silicon carbide semiconductor

Abstract

The present method of forming a silicon oxide layer comprises providing two frequency excitation plasma CVD device which comprises a high frequency electrode, a susceptor electrode, and two matching box for impedance matching between the electrodes and a power supply, wherein one side electrode constituting a tuning condenser of a matching box toward the high frequency electrode is the high frequency electrode; placing a substrate on the susceptor electrode; applying high frequency electric power on the high frequency electrode and the susceptor electrode respectively; and forming a silicon oxide layer on the substrate by generating plasma with using a reaction gas of which main reaction gas is a mixing gas of monosilane and nitrous oxide.

Claims

1. A method of forming a silicon oxide layer comprising the steps of:

providing two frequency excitation plasma CVD device, the device having a susceptor electrode and a high frequency electrode;

placing the substrate on the susceptor electrode;

applying a high frequency electric power on the high frequency electrode and the susceptor electrode respectively; and

forming a silicon oxide layer on the substrate by generating plasma with using a reaction gas in which a flow ratio of the mixing gas of monosilane and nitrous oxide is 10 to 50%.

2. The method according to claim 1, wherein the two frequency excitation plasma CVD device comprises:

a first high frequency power supply;

a high frequency electrode connected to the first high frequency power supply;

a matching box toward the high frequency electrode having a matching circuit between the first high frequency power supply and the high frequency electrode;

a second high frequency power supply;

a susceptor electrode connected to the second high frequency power supply; and

a matching box toward the susceptor electrode having a matching circuit between the second high frequency power supply and the susceptor electrode,

wherein the matching circuit of the matching box toward the high frequency electrode includes a tuning condenser having at least two electrodes, wherein one of the two electrodes is the high frequency electrode.

3. The method according to claim 1, wherein the flow ratio of nitrous oxide to monosilane is 10 or more.

4. The method according to claim 1, wherein the reaction gas includes a gas selected from the group consisting of helium, hydrogen, xenon, oxygen, argon, nitrogen and a mixture thereof.

5. The method according to claim 2, wherein a frequency of high frequency electric power applied to the high frequency electrode is in range of 13.56 MHz to 100 MHz and a frequency of high frequency electric power applied to the susceptor electrode is in range of 50 kHz to 1.6 MHz.

6. The method according to claim 2, wherein a side wall of a housing consisting of a conductive material in the matching box toward the high frequency electrode is non-parallel with a feed wire, the housing stores the feed wire providing the high frequency electrode with the high frequency electric power of the first high frequency power supply through the matching circuit and the matching circuit.

7. A method of manufacturing a thin film transistor having a gate insulator and an interspacing insulator each comprising a silicon oxide layer, the method comprising forming the gate insulator and the interspacing insulator by the method of claim 1.

8. A method of manufacturing a thin film transistor, comprising:

forming a semiconductor layer on a substrate;

exposing the substrate to a reaction gas to form a gate insulator on the semiconductor layer, wherein the reaction gas includes a mixture gas of monosilane and nitrous oxide having a flow ratio of between 10% and 50%;

forming a gate electrode on the gate insulator;

forming source and drain regions in the semiconductor layer except beneath the gate electrode;

exposing the substrate to a reaction gas to form an interspacing insulator over the substrate, wherein the reaction gas includes a mixture gas of monosilane and nitrous oxide having a flow ratio of between 10% and 50%; and

forming source and drain electrodes on the interspacing insulator.

9. The method of claim 8, further comprising:

forming a passivation layer over the substrate; and

forming a pixel electrode on the passivation layer.

10. The method of claim 9, wherein the passivation layer includes a silicon nitride layer.

11. The method of claim 8, wherein the gate insulator layer includes a silicon nitride layer.

12. The method claim 8, wherein the interspacing insulator includes a silicon oxide layer.

13. The method of claim 8, wherein a ratio of nitrous oxide to monosilane in the mixture gas is at least 10.

14. The method of claim 8, wherein the reaction gas further includes a gas selected from a group consisting of helium, hydrogen, xenon, oxygen, argon, nitrogen and a mixture thereof.

15. The method of claim 8, wherein the semiconductor layer is amorphous silicon.

16. The method of claim 8, wherein the semiconductor layer is polysilicon.

17. A method of manufacturing a thin film transistor using a chemical vapor deposition (CVD) apparatus comprising a first frequency power supply, a first electrode connected to the first frequency power supply, a second frequency power supply, a second electrode connected to the second frequency power supply, and a gas inlet, the method comprising:

forming a semiconductor layer on a substrate;

placing the substrate on the second electrode of the CVD apparatus;

applying electric power having a first frequency from the first frequency power supply to the first electrode, while applying electric power having a second frequency from the second frequency power supply to the second electrode, and while providing a reaction gas to the substrate via the gas inlet to form a gate insulator over the semiconductor layer;

forming a gate electrode on the gate insulator;

forming source and drain regions in the semiconductor layer;

forming an interspacing insulator over the substrate; and

forming source and drain electrodes on the interspacing insulator and contacting the source and drain regions respectively.

18. The method of claim 17, wherein the reaction gas includes a mixture gas of monosilane and nitrous oxide having a flow ratio of between 10% and 50%.

19. The method of claim 18, wherein a ratio of nitrous oxide to monosilane in the mixture gas is at least 10.

20. The method of claim 17, wherein the reaction gas further includes a gas selected from a group consisting of helium, hydrogen, xenon, oxygen, argon, nitrogen and a mixture thereof.

21. The method of claim 17, wherein the semiconductor layer comprises amorphous silicon.

22. The method of claim 17, wherein the semiconductor layer comprises polysilicon.

23. The method of claim 17, wherein the first frequency is between 13.56 MHz and 100 MHz.

24. The method of claim 17, wherein the second frequency is between 50 kHz and 1.6 MHz.

25. The method of claim 17, wherein the first frequency is about 40.68 MHz.

26. The method of claim 17, wherein the first frequency is about 27.12 MHz.

27. The method of claim 17, wherein forming the interspacing insulator over the substrate comprises:

placing the substrate on the second electrode of the CVD apparatus; and

applying the electric power having the first frequency from the first frequency power supply to the first electrode, while applying the electric power having the second frequency from the second frequency power supply to the second electrode, and while providing the reaction gas to the substrate via the gas inlet.

28. A method of manufacturing a thin film transistor using a chemical vapor deposition (CVD) apparatus comprising a first frequency power supply, a first electrode connected to the first frequency power supply, a second frequency power supply, a second electrode connected to the second frequency power supply, and a gas inlet, the method comprising:

forming a semiconductor layer on a substrate;

forming a gate insulator;

forming a gate electrode on the gate insulator;

forming source and drain regions in the semiconductor layer;

placing the substrate on the second electrode of the CVD apparatus;

applying electric power having a first frequency from the first frequency power supply to the first electrode, while applying electric power having a second frequency from the second frequency power supply to the second electrode, and while providing a reaction gas to the substrate via the gas inlet to form an interspacing insulator over the substrate; and

forming source and drain electrodes on the interspacing insulator and contacting the source and drain regions respectively.

29. The method of claim 28, wherein the reaction gas includes a mixture gas of monosilane and nitrous oxide having a flow ratio of between 10% and 50%.

30. The method of claim 29, wherein a ratio of nitrous oxide to monosilane in the mixture gas is at least 10.

31. The method of claim 28, wherein the reaction gas further includes a gas selected from a group consisting of helium, hydrogen, xenon, oxygen, argon, nitrogen and a mixture thereof.

32. The method of claim 28, wherein the semiconductor layer comprises amorphous silicon.

33. The method of claim 28, wherein the semiconductor layer comprises polysilicon.

34. The method of claim 28, wherein the first frequency is between 13.56 MHz and 100 MHz.

35. The method of claim 28, wherein the second frequency is between 50 kHz and 1.6 MHz.

36. The method of claim 28, wherein the first frequency is about 40.68 MHz.

37. The method of claim 28, wherein the first frequency is about 27.12 MHz.