Anti-reflection high conductivity multi-layer coating on CRT surface made by vacuum sputtering and wet coating

• US 6,337,771 B1
• Filed: 05/03/2000
• Issued: 01/08/2002
• Est. Priority Date: 05/03/2000
• Status: Expired due to Fees

• Current Assignee: Applied Vacuum Coating Technologies Co., Ltd.
• Original Assignee: Applied Vacuum Coating Technologies Co., Ltd.
• Inventors: Lee, Jau-Sung, Chu, Jau-Jier
• Primary Examiner(s): HENRY, JON W
• Application Number:
  US09/563,406
• Time in Patent Office: 615 Days
• Field of Search: 359/580, 359/582, 359/586, 359/588, 359/589, 359/601, 313/635, 427/109, 427/167, 427/168, 427/126.2
• US Class Current: 359/586
• CPC Class Codes: G02B 1/116 including electrically conducting layers
• CPC Class Codes: G02B 1/16 having an anti-static effect, e.g. electrically conducting coatings
• CPC Class Codes: H01J 2209/012 Coating
• CPC Class Codes: H01J 29/868 Screens covering the input or output face of the vessel, e.g. transparent anti-static coatings, X-ray absorbing layers

Abstract

An anti-reflection high conductivity multi-layer coating for CRT products includes three layers coating created by vacuum sputtering and a fourth layer coating created by wet coating process. A first layer, nearest to the substrate, is made of a transparent conductive oxide material having a refractive index within the approximating range of 1.85 to 2.1 at a wavelength of 520 nm. The second layer is formed from an oxide material having a refractive index within the range of 1.45 to 1.50 at a wavelength of 520 nm. The third layer is formed of an oxide material having a refractive index within the range of 1.85 to 2.2 at a wavelength of 520 nm. The fourth layer has a refractive index within the range of 1.45 to 1.55 at a wavelength of 520 nm.

Claims

1. An anti-reflection high conductivity multi-layer coating for CRT products comprising first, second, third and fourth consecutive layers with the first layer being the nearest layer to a substrate, said layers being created by a combination process including a vacuum coating and a wet coating;

said first layer being positioned between said substrate and said second layer and comprising a conductive oxide material having a refractive index between 1.85 to 2.1 at a wavelength of 520 nm, said first layer having a physical thickness of 20-80 nm, and being produced by vacuum sputtering coating;

said second layer being positioned on said first layer and comprising an oxide material having a refractive index within the approximating range of 1.45 to 1.50 at a wavelength of 520 nm and a physical thickness of 10 nm to 50 nm, said second layer being produced by vacuum sputtering coating;

said third layer being positioned on said second layer and comprising a high chemical resistance oxide material having a refractive index within 1.85 to 2.2 at a wavelength of 520 nm and a physical thickness of 40.0-60.0 nm, said third layer being produced by vacuum sputtering coating; and

said fourth layer being positioned on said third layer and comprising an oxide material having a refractive index within 1.45 to 1.55 at a wavelength of 520 nm and a physical thickness of 60-120 nm, said fourth layer being produced by wet coating.

2. The anti-reflection high conductivity multi-layer coating of claim 1, wherein said substrate is CRT.

3. The anti-reflection high conductivity multi-layer coating of claim 1, wherein said substrate is glass.

4. The anti-reflection high conductivity multi-layer coating of claim 1, wherein the first layer is ITO, said second layer is SiO2, said third layer is SnO2 and fourth layer is silica.

5. The anti-reflection high conductivity multi-layer coating of claim 1, wherein the first layer comprises conductive oxides selected from the group consisting of ITO, IZO and ATO.

6. The anti-reflection high conductivity multi-layer coating of claim 1, wherein the second layer comprises oxides selected from the group consisting of SiO₂ and SiAl-Oxide.

7. The anti-reflection high conductivity multi-layer coating of claim 1, wherein the third layer comprises oxides selected from the group consisting of SnO₂ and ZnO.

8. The anti-reflection high conductivity multi-layer coating of claim 1, wherein the fourth layer comprises oxides selected from the group consisting of SiO₂, SiAl-Oxide and SiO compound.

9. The anti-reflection high conductivity multi-layer coating of claim 1, wherein the vacuum coating includes evaporating or sputtering coating in either a batch or an in-line system.