Laser delivery system and method for photolithographic mask repair

• US 6,341,009 B1
• Filed: 02/24/2000
• Issued: 01/22/2002
• Est. Priority Date: 02/24/2000
• Status: Expired due to Term

• Current Assignee: Control Laser Corporation (Han's Laser Technology Industry Group Co., Ltd.)
• Original Assignee: Quantronix Incorporated
• Inventors: Fu, Qiang, OʼConnor, John
• Primary Examiner(s): Gray, David M.
• Assistant Examiner(s): NGUYEN, HUNG
• Application Number:
  US09/512,580
• Time in Patent Office: 698 Days
• Field of Search: 355/53, 355/30, 355/67-71, 355/77, 356/394, 356/398-400, 356/237, 430/5, 430/22, 430/30, 430/311, 250/559.45, 250/559.46
• US Class Current: 355/67
• CPC Class Codes: B23K 26/032 using optical means
• CPC Class Codes: B23K 26/0624 using ultrashort pulses, i.e. pulses of 1ns or less
• CPC Class Codes: G03F 1/72 Repair or correction of mask defects

Abstract

A system and method for photolithographic mask repair. The system includes a structure for supporting a mask to be operated on, a laser emitting device for effecting mask repair, a light source adjacent the support structure for selected illumination of the mask, a laser processor for effecting sequential angular manipulation of a laser beam projecting from the laser emitting device, a computer device for controlling the sequential angular manipulation so as to capture a generally complete waveform of the beam, and a microscope for multi-aspect viewing of the mask during navigation of the beam about the mask. The computer device, simultaneously with manipulation of the beam, effecting fine motion control of the beam, controlled movement of the motorized aperture for effecting the sequential angular manipulation, controlled support structure movement, and image data processing.

Claims

1. A system for photolithographic mask repair which comprises:

a structure for supporting a mask to be operated on;

a laser emitting device for effecting mask repair;

a light source adjacent the support structure for selected illumination of the mask;

a laser processor for effecting sequential angular manipulation of a laser beam projecting from the laser emitting device, the processor including an adjustable beam splitter for effecting off-axis laser illumination, a motorized aperture for facilitating incremental mask repair, an optical system for image reduction, and a device for viewing the mask during repair;

a computer device for controlling the sequential angular manipulation so as to capture a generally complete waveform of the beam; and

a microscope for multi-aspect viewing of the mask during navigation of the beam about the mask.

2. The system set forth in claim 1 wherein the structure for supporting the mask is a retractable platform.

3. The system set forth in claim 1 wherein the laser emitting device emits an amplified Ti:

S laser.

4. The system set forth in claim 1 wherein the laser emitting device emits a He:

Cd laser.

5. The system set forth in claim 1 wherein the laser emitting device emits a Nd:

Yag laser.

6. The system set forth in claim 1 wherein the computer device, simultaneously with manipulation of the laser, effects fine motion control of the beam.

7. The system set forth in claim 6 wherein the computer device, simultaneously with fine motion control of the beam, effects controlled movement of a motorized aperture for effecting the sequential angular manipulation.

8. The system set forth in claim 7 wherein the computer device, simultaneously with controlling movement of the motorized aperture, effects controlled support structure movement.

9. The system set forth in claim 8 wherein the computer device, simultaneously with controlling movement of the platform, processes image data.

10. The system set forth in claim 1 wherein the microscope is a video microscope for viewing and analyzing the mask.

11. The system set forth in claim 10 wherein the microscope includes a relatively low magnification video camera and a relatively high magnification video camera.

12. The system set forth in claim 10 wherein the microscope includes a DUV imaging and transmission measurement system.

13. A system for photolithographic mask repair which comprises:

a structure for supporting a mask to be operated on;

a laser emitting device for effecting mask repair;

a light source adjacent to the support structure for selected illumination of the mask;

a laser processor for effecting sequential angular manipulation of a laser beam projecting from the laser emitting device, the processor including an adjustable beam splitter for effecting off-axis laser illumination, a motorized aperture for facilitating incremental mask repair, an optical system for image reduction, and a device for viewing the mask during repair;

a computer device for controlling the sequential angular manipulation so as to capture a generally complete waveform of the beam; and

a microscope for multi-aspect viewing of the mask during navigation of the beam about the mask, the computer device, simultaneously with manipulation of the beam, effecting fine motion control of the beam, controlled movement of the motorized aperture for effecting the sequential angular manipulation, controlled support structure movement, and image data processing.

14. The system set forth in claim 13 wherein the structure for supporting the mask is a retractable platform.

15. The system set forth in claim 13 wherein the laser emitting device emits an amplified Ti:

S laser.

16. The system set forth in claim 13 wherein the laser emitting device emits a He:

Cd laser.

17. The system set forth in claim 13 wherein the laser emitting device emits a Nd:

Yag laser.

18. A system for photolithographic mask repair which comprises:

a structure for supporting a mask to be operated on;

a laser emitting device for effecting mask repair;

a light source adjacent to the support structure for selected illumination of the mask;

a laser processor for effecting sequential angular manipulation of a laser beam projecting from the laser emitting device;

a computer device for controlling the sequential angular manipulation as to capture a generally complete waveform of the beam; and

a microscope for multi-aspect viewing of the mask during navigation of the beam about the mask, the microscope including a relatively low magnification video camera, a relatively high magnification video camera, and a DUV imaging and transmission measurement system.

19. A system for photolithographic mask repair which comprises:

a structure for supporting a mask to be operated on;

a laser emitting device for effecting mask repair;

a light source adjacent to the support structure for selected illumination of the mask;

a laser processor for effecting sequential angular manipulation of a laser beam projecting from the laser emitting device;

a computer device for controlling the sequential angular manipulation as to capture a generally complete waveform of the beam; and

a microscope for multi-aspect viewing of the mask during navigation of the beam about the mask.

20. A system for photolithographic mask repair which comprises:

a mask to be operated on;

a laser emitting device for effecting mask repair;

a laser processor for effecting sequential angular manipulation of a laser beam projecting from the laser emitting device, the processor including an adjustable beam splitter for effecting off-axis laser illumination, a motorized aperture for facilitating incremental mask repair, an optical system for image reduction, and a device for viewing the mask during repair;

a computer device for controlling the sequential angular manipulation so as to capture a generally complete waveform of the beam; and

a microscope for multi-aspect viewing of the mask during navigation of the beam about the mask.

21. A system for photolithographic mask repair which comprises a mask to be operated on, a laser emitting device for effecting mask repair, and a laser processor for effecting sequential angular manipulation of a laser beam projecting from the laser emitting device, the processor including an adjustable beam splitter for effecting off-axis laser illumination, a motorized aperture for facilitating incremental mask repair, an optical system for image reduction, and a device for viewing the mask during repair.

22. A method for photolithographic mask repair comprising the steps of:

i. locating a photo-mask on a relatively stationary, isolated support structure;

ii. activating a laser emitting device for effecting mask repair;

iii. actuating a light source adjacent to the support structure for selected illumination of the mask;

iv. passing a laser beam emitted from the laser emitting device through a laser processor for effecting sequential angular manipulation of the laser beam, the processor including an adjustable beam splitter for effecting off-axis illumination of the laser beam, a motorized aperture for facilitating incremental mask repair, an optical system for image reduction, and a device for viewing the mask during repair;

v. controlling the sequential angular manipulation so as to capture a generally complete waveform of the beam; and

vi. simultaneously with the sequential angular manipulation, providing multi-aspect viewing of the mask during navigation of the beam about the mask, effecting fine motion control of the beam, controlled movement of the motorized aperture for effecting the sequential angular manipulation, controlled support structure movement, and image data processing.

23. A method for photolithographic mask repair comprising the steps of:

i. activating a laser emitting device for effecting mask repair;

ii. locating a photo-mask on a relatively stationary, isolated support structure;

iii. actuating a light source adjacent to the support structure for selected illumination of the mask;

iv. passing a laser beam emitted from the laser emitting device through a laser processor for effecting sequential angular manipulation of the laser beam, the processor including an adjustable beam splitter for effecting off-axis illumination of the laser beam, a motorized aperture for facilitating incremental mask repair, an optical system for image reduction, and a device for viewing the mask during repair;

v. controlling the sequential angular manipulation so as to capture a generally complete waveform of the beam; and

vi. simultaneously with the sequential angular manipulation, providing multi-aspect viewing of the mask during navigation of the beam about the mask, effecting fine motion control of the beam, controlled movement of the motorized aperture for effecting the sequential angular manipulation, controlled support structure movement, and image data processing.

24. A method for photolithographic mask repair comprising the steps of:

i. activating a laser emitting device for effecting mask repair;

ii. actuating a light source adjacent to the support structure for selected illumination of the mask;

iii. locating a photo-mask on a relatively stationary, isolated support structure;

iv. passing a laser beam emitted from the laser emitting device through a laser processor for effecting sequential angular manipulation of the laser beam, the processor including an adjustable beam splitter for effecting off-axis illumination of the laser beam, a motorized aperture for facilitating incremental mask repair, an optical system for image reduction, and a device for viewing the mask during repair;

v. controlling the sequential angular manipulation so as to capture a generally complete waveform of the beam; and

vi. simultaneously with the sequential angular manipulation, providing multi-aspect viewing of the mask during navigation of the beam about the mask, effecting fine motion control of the beam, controlled movement of the motorized aperture for effecting the sequential angular manipulation, controlled support structure movement, and image data processing.