Gas purge protection of sensors and windows in a gas phase processing reactor
First Claim
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1. A method of monitoring a process in a gas phase process chamber, the method comprising:
- providing an optically transparent window on a wall of a gas phase process chamber;
separating the window from the chamber by a prechamber;
feeding a purge gas through the prechamber to prevent deposition of contaminants on the window; and
optically monitoring the process within the chamber through the window.
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Abstract
A gas purged viewport for endpoint detection in a gas phase processing chamber is provided which prevents contamination of an optical monitoring window by use of a purge gas flow. The purge gas purges the viewport and prevents deposition of byproducts and contaminants on the window which will adversely effect endpoint detection. The gas purge viewport includes a prechamber between the optically transparent window and the process chamber. The purge gas is passed through the prechamber and into the processing chamber to purge the window. The gas purge system may also be used to purge other parts such as sensors.
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Citations
16 Claims
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1. A method of monitoring a process in a gas phase process chamber, the method comprising:
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providing an optically transparent window on a wall of a gas phase process chamber;
separating the window from the chamber by a prechamber;
feeding a purge gas through the prechamber to prevent deposition of contaminants on the window; and
optically monitoring the process within the chamber through the window. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 15)
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14. A method of preventing adverse effects on a part in a gas phase process chamber, the method comprising:
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positioning a prechamber between a part and a gas phase process chamber; and
feeding a purge gas through the prechamber and into the process chamber to purge the part by preventing gases within the process chamber from adversely effecting the part. - View Dependent Claims (16)
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Specification