Low resistance magnetic tunnel junction device with bilayer or multilayer tunnel barrier
First Claim
1. A magnetic tunnel junction device comprising:
- a first ferromagnetic layer and a second ferromagnetic layer, one of the ferromagnetic layers having its magnetic moment fixed in a preferred direction in the presence of an applied magnetic field in the range of interest and the other of the ferromagnetic layers having its magnetic moment free to rotate in the presence of the applied magnetic field in the range of interest; and
a tunnel barrier layer located between the first and second ferromagnetic layers, the tunnel barrier layer comprising a first barrier layer of insulating material formed on and in contact with the first ferromagnetic layer and a second barrier layer of insulating material different from the material of the first barrier layer and located between the first barrier layer and the second ferromagnetic layer;
and wherein the magnetic tunnel junction device has a resistance-area value less than approximately 1000 Ω
(μ
m)2.
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Abstract
A low resistance magnetic tunnel junction (MTJ) device has a bilayer or multilayer as the insulating tunnel barrier. In one embodiment the tunnel barrier is a bilayer of a first layer of magnesium oxide on the bottom magnetic electrode and an aluminum oxide layer on the magnesium oxide layer. This bilayer is formed by oxidizing a bilayer of Mg/Al. In a second embodiment the tunnel barrier is a bilayer of first layer of aluminum nitride and a second layer of aluminum oxide on top of the aluminum nitride first layer, with this bilayer formed by oxidizing a bilayer of AlN/Al. MTJ devices with trilayer barriers, such as AlN/Al2O3/AlN, MgO/Al2O3/MgO and Al2O3/MgO/Al2O3 are also possible. The resulting magnetic tunnel junction devices have resistance-area values less than 1000 Ω(μm)2 and preferably in the range of 0.1 to 100 Ω(μm)2, making the devices suitable for magnetic read sensors.
287 Citations
13 Claims
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1. A magnetic tunnel junction device comprising:
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a first ferromagnetic layer and a second ferromagnetic layer, one of the ferromagnetic layers having its magnetic moment fixed in a preferred direction in the presence of an applied magnetic field in the range of interest and the other of the ferromagnetic layers having its magnetic moment free to rotate in the presence of the applied magnetic field in the range of interest; and
a tunnel barrier layer located between the first and second ferromagnetic layers, the tunnel barrier layer comprising a first barrier layer of insulating material formed on and in contact with the first ferromagnetic layer and a second barrier layer of insulating material different from the material of the first barrier layer and located between the first barrier layer and the second ferromagnetic layer;
and wherein the magnetic tunnel junction device has a resistance-area value less than approximately 1000 Ω
(μ
m)2.- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A magnetic tunnel junction read sensor comprising:
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a first electrical lead;
a fixed ferromagnetic layer having a magnetic moment that is fixed in a preferred direction in the presence of an applied magnetic field in the range of interest;
an antiferromagnetic layer between the first lead and the fixed ferromagnetic layer for pinning the magnetic moment of the fixed ferromagnetic layer in its fixed direction;
a free ferromagnetic layer whose magnetic moment is free to rotate in the presence of the applied magnetic field in the range of interest;
a bilayer insulating tunnel barrier layer located between the fixed and free ferromagnetic layers, the bilayer consisting of a first layer consisting essentially of aluminum nitride on and in contact with the fixed ferromagnetic layer and a second layer consisting essentially of aluminum oxide located between and in contact with the aluminum nitride layer and the free ferromagnetic layer; and
a second electrical lead on the free ferromagnetic layer; and
wherein the magnetic tunnel junction read sensor has a resistance-area value in the range of approximately 0.1 to 100 Ω
(μ
m)2.
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Specification