Externally excited torroidal plasma source

• US 6,348,126 B1
• Filed: 08/11/2000
• Issued: 02/19/2002
• Est. Priority Date: 08/11/2000
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Tanaka, Tsutomu, Ye, Yan, Ramaswamy, Kartik, Hanawa, Hiroji, Nguyen, Andrew, Collins, Kenneth S
• Primary Examiner(s): DANG, THI D
• Application Number:
  US09/636,699
• Time in Patent Office: 557 Days
• Field of Search: 156/345, 118/723.I
• US Class Current: 156/345.49
• CPC Class Codes: H01J 37/32082 Radio frequency generated discharge H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma

Abstract

A plasma reactor for processing a workpiece includes a chamber adapted to accept processing gases in an evacuated environment including a workpiece support, a hollow conduit defining a wall of the chamber, and having respective ends opening adjacent opposite sides of the workpiece support, and a chamber wall portion in facing relationship to the workpiece support and defining a workpiece processing zone therebetween, the processing zone and the interior of the conduit forming a torroidal interior path, and an RF energy applicator irradiating gas within the chamber to maintain a plasma within the torroidal interior path.

Claims

1. A plasma reactor for processing a workpiece comprising:

a chamber adapted to accept processing gases in an evacuated environment including a workpiece support, a hollow conduit defining a wall of the chamber, and having respective ends opening adjacent opposite sides of said workpiece support, and a chamber wall portion in facing relationship to the workpiece support and defining a workpiece processing zone therebetween, said processing zone and the interior of said conduit forming a torroidal interior path;

an RF energy applicator irradiating gas within said chamber to maintain a plasma within the torroidal interior path.

2. The plasma reactor of claim 1 wherein said wall portion and workpiece support are in centered, closely spaced relationship to each other.

3. The reactor of claim 1 wherein said applicator comprises a coil adapted to accept RF power and to irradiate said gas via inductive coupling.

4. The reactor of claim 3 wherein said coil is adjacent said conduit.

5. The reactor of claim 1 wherein the height of the workpiece processing zone between said wall portion and workpiece support is less than a transverse dimension of said conduit.

6. The reactor of claim 1 wherein the cross-sectional area of the workpiece processing zone between said wall portion and said workpiece support is less than a cross-sectional area of said conduit.

7. The reactor of claim 1 wherein the conduit includes an insulating gap between said respective ends.

8. The reactor of claim 1 in which an electric field extends across the workpiece processing zone generally from one end of said conduit to the other.

9. The reactor of claim 1 in which RF energy is applied by said applicator to a portion of said path away from said workpiece processing zone.

10. The reactor of claim 1 which further comprises a gas distribution plate adjacent said wall portion, and in facing relationship to said workpiece support to define said workpiece processing zone therebetween.

11. The reactor of claim 1 which further includes a second hollow conduit generally transverse to the first conduit, said second conduit having respective ends opening adjacent opposed sides of said workpiece support, said processing zone and second conduit forming a second torroidal interior path.

12. The reactor of claim 11 which further includes a second RF energy applicator capable of maintaining a plasma within the second torroidal interior path.

13. The reactor of claim 12 in which the respective RF energy applicators are driven to cause plasma currents across the workpiece support to rotate generally in the plane of the workpiece support.

14. The reactor of claim 13 in which the respective energy applicators are driven by respective RF signals of substantially the same frequency but of differing phase to produce said rotating plasma.

15. The reactor of claim 11 which further includes a third hollow conduit generally transverse to the first and second conduits, said third conduit having respective ends opening adjacent opposed sides of said workpiece support, said processing zone and third conduit forming a third torroidal interior path.

16. The reactor of claim 15 further comprising second and third RF energy applicators capable of maintaining plasmas in said second and third torroidal paths respectively.

17. The reactor of claim 16 further comprising first, second and third impedance match elements connected to said first, second and third RF energy applicators, respectively, wherein said first, second and third RF energy applicators apply RF signals of different frequencies.

18. The reactor of claim 1 further comprising an impedance match element connected to said RF energy applicator.

19. The reactor of claim 18 wherein said RF energy applicator comprises a core surrounding a portion of said conduit, and a primary winding around a section of said core and adapted to be coupled to a source of RF power.

20. The reactor of claim 19 wherein said impedance match element is connected between said primary winding and the source of RF power.

21. The reactor of claim 19 wherein said impedance match element comprises a secondary winding around another section of said core and a tuning capacitor connected across said secondary winding.

22. The reactor of claim 1 wherein an RF plasma current flows across the workpiece processing zone between said conduit ends.

23. The reactor of claim 1 wherein said RF plasma current is driven by said RF energy applicator.

24. The reactor of claim 22 wherein the respective ends of the conduit and workpiece support are positioned for said RF plasma current flow across the workpiece processing zone to be generally parallel to the face of the workpiece support.

25. The reactor of claim 22 wherein said workpiece support accepts an RF bias signal.

26. The reactor of claim 1 comprising a plurality of hollow conduits, each conduit having ends respectively opening adjacent opposed sides of said workpiece support, each of said conduits together with the processing zone forming respective torroidal plasma paths.

27. The reactor of claim 26 wherein the said plurality of hollow conduits are non-intersecting whereby respective torroidal interior paths intersect only in the workpiece support zone.

28. The reactor of claim 26 wherein said ends are generally azimuthally evenly spaced from one another.

29. The reactor of claim 26 wherein RF plasma current flows in a multiplicity of torroidal paths between different conduit ends.

30. The reactor of claim 26 further comprising a plurality of RF power applicators adapted to maintain a plasma in respective ones of said conduits.

31. The reactor of claim 30 wherein said plurality of RF power applicators are adapted to provide respective RF inductive fields capable of maintaining plasma currents in respective closed torroidal paths.