Jet plasma process for deposition of coatings
First Claim
1. A method for the formation of an organic coating on a substrate comprising:
- providing a substrate in a vacuum;
providing at least one vaporized organic material comprising a least one component from at least one source, wherein the vaporized organic material is capable of condensing in a vacuum of less than about 130 Pa at or below room temperature;
providing a plasma from at least one source other than the source of the vaporized organic material;
directing the vaporized organic material and the plasma toward the substrate wherein the substrate is in close proximity to a radio frequency bias electrode such that the substrate is exposed to a radio frequency bias voltage; and
causing the vaporized organic material to condense and polymerize on the substrate in the presence of the plasma to form an organic coating.
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Abstract
The present invention provides a method for the formation of an organic coating on a substrate. The method includes: providing a substrate in a vacuum; providing at least one vaporized organic material comprising at least one component from at least one source, wherein the vaporized organic material is capable of condensing in a vacuum of less than about 130 Pa; providing a plasma from at least one source other than the source of the vaporized organic material; directing the vaporized organic material and the plasma toward the substrate; and causing the vaporized organic material to condense and polymerize on the substrate in the presence of the plasma to form an organic coating.
173 Citations
23 Claims
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1. A method for the formation of an organic coating on a substrate comprising:
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providing a substrate in a vacuum;
providing at least one vaporized organic material comprising a least one component from at least one source, wherein the vaporized organic material is capable of condensing in a vacuum of less than about 130 Pa at or below room temperature;
providing a plasma from at least one source other than the source of the vaporized organic material;
directing the vaporized organic material and the plasma toward the substrate wherein the substrate is in close proximity to a radio frequency bias electrode such that the substrate is exposed to a radio frequency bias voltage; and
causing the vaporized organic material to condense and polymerize on the substrate in the presence of the plasma to form an organic coating. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
causing the plasma to interact with the vaporized organic material and form a reactive organic species; and
contacting the substrate with the reactive organic species to form an organic coating.
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8. The method of claim 1 wherein the step of causing the vaporized organic material to condense and polymerize comprises:
condensing the vaporized organic material on the substrate in the presence of the plasma to form reactive species that polymerize to form the organic coating.
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9. The method of claim 1 wherein the coating has a density that is about 50% greater than the density of the major component of the organic material prior to vaporization.
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10. The method of claim 1 wherein the vaporized organic material comprises vaporized mineral oil.
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11. The method of claim 10 wherein the plasma comprises a carbon-rich plasma and the vaporized organic material comprises vaporized dimethylsiloxane oil.
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12. The method of claim 10 wherein the coating formed comprises a layer of a carbon-rich material, a layer of dimethylsiloxane that is at least partially polymerized, and an intermediate layer of a carbon/dimethylsiloxane composite.
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13. The method of claim 1 wherein the step of providing a plasma comprises generating a plasma in a vacuum chamber by:
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injecting a plasma gas into a hollow cathode system;
providing a sufficient voltage to create and maintain a plasma within the hollow cathode system; and
maintaining a vacuum in the vacuum chamber sufficient for maintaining the plasma.
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14. The method of claim 13 wherein the hollow cathode system is a hollow cathode slot system comprising two electrode plates arranged parallel to each other.
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15. The method of claim 14 wherein the hollow cathode slot system comprises a first compartment having therein a hollow cathode tube, a second compartment connected to the first compartment, and a third compartment connected to the second compartment having therein the two parallel plates.
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16. The method of claim 15 wherein the step of injecting a plasma gas comprises injecting a carrier gas into the first compartment and a feed gas into the second compartment.
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17. The method of claim 16 wherein a plasma is formed from the carrier gas in the first compartment.
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18. The method of claim 16 wherein a plasma is formed from the carrier gas and the feed gas in the third compartment.
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19. The method of claim 18 wherein the feed gas is selected from the group consisting of saturated and unsaturated hydrocarbons, nitrogen-containing hydrocarbons, oxygen-containing hydrocarbons, halogen-containing hydrocarbons, and silicon-containing hydrocarbons.
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20. The method of claim 13 wherein the hollow cathode system comprises a hollow cathode tube.
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21. The method of claim 13 wherein the hollow cathode system comprises:
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a cylinder having an outlet end;
a magnet surrounding the outlet end of the cylinder; and
a tube having a leading edge, wherein the tube is positioned inside the cylinder and recessed such that the leading edge of the tube is in the plane of the center line of the magnet.
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22. The method of claim 21 wherein the magnet is made of a ceramic material.
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23. The method of claim 21 wherein the tube is made of a ceramic material.
Specification