Method for feeding gases for use in semiconductor manufacturing
First Claim
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1. A method for feeding gases to semiconductor manufacturing facilities, comprising the steps of:
- providing a single flow rate controller unit for gas supply for a plurality of semiconductor manufacturing processes or steps;
serially supplying one or more types of gases to said manufacturing processes or steps by switching at specific time intervals to each process or step; and
regulating the flow rate by said single flow rate controller.
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Abstract
An apparatus for feeding gases for use in semiconductor manufacturing reduced in size and manufacturing costs and facilitating maintenance and operation of the gas supply system. The apparatus comprises a plurality of gas supply sources, gas source valves provided on the gas lead-out pipes from the respective gas supply sources, flow rate controllers provided on main gas feed pipes into which the lead-out pipes converge, and gas supply valves provided on the outlet side of the flow rate controllers.
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Citations
8 Claims
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1. A method for feeding gases to semiconductor manufacturing facilities, comprising the steps of:
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providing a single flow rate controller unit for gas supply for a plurality of semiconductor manufacturing processes or steps;
serially supplying one or more types of gases to said manufacturing processes or steps by switching at specific time intervals to each process or step; and
regulating the flow rate by said single flow rate controller. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
determining data comprising flow rate control characteristics for each type of gas to be supplied and flow rate for each manufacturing process or step;
storing said data in a storage means; and
retrieving said data from said storage means at the time of said switching; and
wherein said step of regulating comprises regulating the flow rate with said flow rate controller based on said data.
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4. A method for feeding gases to semiconductor manufacturing facilities as defined in claim 1, wherein the flow rate controller is a pressure-type flow controller, and further comprising the following steps:
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determining a flow factor against a reference gas for each of the types of gases to be supplied;
storing said data; and
when the type of gas is changed, adjusting a flow rate specifying signal Qs for the gas to be switched over to kQe, wherein Qs=kQe, wherein Qe is a set flow rate signal against the reference gas and k is a flow rate conversion rate.
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5. A method for feeding gases to semiconductor manufacturing facilities as defined in claim 1, wherein the flow rate controller is a pressure-type flow control system having a plurality of orifices with different bores in parallel;
- and further comprising the step;
selectively actuating said orifices according to a flow rate of the gas to be supplied and to which the system is switched over.
- and further comprising the step;
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6. A method for feeding gases to semiconductor manufacturing facilities as defined in claim 2, and further comprising the steps of:
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determining data comprising flow rate control characteristics for each type of gas to be supplied and flow rate for each manufacturing process or step;
storing said data in a storage means;
retrieving said data from said storage means at the time of said switching; and
regulating the flow rate with said flow rate controller based on said data.
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7. A method for feeding gases to semiconductor manufacturing facilities as defined in claim 2, wherein the flow rate controller is a pressure-type flow controller, and further comprising the following steps:
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determining a flow factor against a reference gas for each of the types of gases to be supplied;
storing said data; and
when the type of gas is changed, adjusting a flow rate specifying signal Qs for the gas to be switched over to kQe, wherein Qs=kQe, wherein Qe is a set flow rate signal against the reference gas and k is a flow rate conversion rate.
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8. A method for feeding gases to semiconductor manufacturing facilities as defined in claim 2, wherein the flow rate controller is a pressure-type flow control system having a plurlaity of orifices with different bores in paralle;
- and further comprising the step;
selectively actuating said orifices according to a flow rate of the gas to be supplied and to which the system is switched over.
- and further comprising the step;
Specification