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Method for feeding gases for use in semiconductor manufacturing

  • US 6,360,762 B2
  • Filed: 01/22/2001
  • Issued: 03/26/2002
  • Est. Priority Date: 04/22/1999
  • Status: Active Grant
First Claim
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1. A method for feeding gases to semiconductor manufacturing facilities, comprising the steps of:

  • providing a single flow rate controller unit for gas supply for a plurality of semiconductor manufacturing processes or steps;

    serially supplying one or more types of gases to said manufacturing processes or steps by switching at specific time intervals to each process or step; and

    regulating the flow rate by said single flow rate controller.

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