Gas-driven microturbine
First Claim
Patent Images
1. A gas-driven microturbine developed using a polysilicon surface-micromachining batch-fabricated technique comprising:
- a substrate base;
a holding tank formed on said substrate base;
a fuel delivery system formed on said substrate base further comprising at least one inlet tube for transporting a fuel set from said holding tank to a reaction chamber;
a reaction chamber formed on said substrate base, further comprising a means for heating said fuel set;
a flow channel formed on said substrate base extending from said reaction chamber and protruding into a turbine housing;
a turbine housing formed on said substrate base in which said flow channel receives a high-flow gas stream generated in said reaction chamber by heating of said fuel set to drive a turbine;
a turbine contained within said turbine housing and made rotatably secured by a central turbine hub formed on and attached to said substrate base;
a mechanical linkage arm formed on said substrate base and attached to said turbine by a pin joint, wherein rotational motion from said turbine induces linear motion on said mechanical linkage arm;
a mechanical load formed on said substrate and located in close proximity to said turbine housing wherein said mechanical load is attached to said mechanical linkage arm;
an exhaust port means formed on said substrate base extending from said turbine housing.
3 Assignments
0 Petitions
Accused Products
Abstract
A microturbine fabricated by a three-level semiconductor batch-fabrication process based on polysilicon surface-micromachining. The microturbine comprises microelectromechanical elements formed from three polysilicon multi-layer surfaces applied to a silicon substrate. Interleaving sacrificial oxide layers provides electrical and physical isolation, and selective etching of both the sacrificial layers and the polysilicon layers allows formation of individual mechanical and electrical elements as well as the required space for necessary movement of rotating turbine parts and linear elements.
-
Citations
17 Claims
-
1. A gas-driven microturbine developed using a polysilicon surface-micromachining batch-fabricated technique comprising:
-
a substrate base;
a holding tank formed on said substrate base;
a fuel delivery system formed on said substrate base further comprising at least one inlet tube for transporting a fuel set from said holding tank to a reaction chamber;
a reaction chamber formed on said substrate base, further comprising a means for heating said fuel set;
a flow channel formed on said substrate base extending from said reaction chamber and protruding into a turbine housing;
a turbine housing formed on said substrate base in which said flow channel receives a high-flow gas stream generated in said reaction chamber by heating of said fuel set to drive a turbine;
a turbine contained within said turbine housing and made rotatably secured by a central turbine hub formed on and attached to said substrate base;
a mechanical linkage arm formed on said substrate base and attached to said turbine by a pin joint, wherein rotational motion from said turbine induces linear motion on said mechanical linkage arm;
a mechanical load formed on said substrate and located in close proximity to said turbine housing wherein said mechanical load is attached to said mechanical linkage arm;
an exhaust port means formed on said substrate base extending from said turbine housing. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
-
-
17. A three-level polysilicon surface-micromachining batch-fabrication process for developing a gas-driven microturbine having core propulsion components including turbine housing, rotatable turbine including turbine blades and central turbine hub, fuel delivery system, fuel lines, holding tank, means for heating a fuel set, reaction chamber, flow channels, exhaust port, and a mechanical linearly-movable actuated element, said process comprising the steps of:
-
providing a silicon substrate base in a plane;
providing on said substrate base an oxide layer and a nitride layer to form an insulation layer;
patterning said insulation layer and etching said oxide layer with an etch mask to form at least one full-depth cut into said substrate base, said at least one fill-depth cut acting as an electrical interconnect;
providing on said insulation layer a first layer of polysilicon (POLY
0) to form a voltage reference and an electrical interconnect plane;
depositing a photoresist material over said first polysilicon layer;
patterning said layer by exposing the photoresist material to ultraviolet light through a photoresist mask to make it susceptible to a developer;
removing areas of the exposed photoresist material made susceptible to the developer by applying ultraviolet light to the exposed photoresist material and then cleaning the layered substrate base to remove excess material;
etching the patterned first polysilicon layer by reactive ion etching to define the base portions of a turbine housing fixed to and extending above said substrate;
providing a layer of oxide to form a first sacrificial layer;
depositing a layer of photoresist material on the first sacrificial layer;
patterning the first sacrificial layer by exposing the photoresist material to ultraviolet light through a photoresist mask to make it susceptible to a developer;
removing areas of the exposed photoresist material made susceptible to the developer by applying ultraviolet light to, the exposed photoresist material and then cleaning the layered substrate base to remove excess material;
etching to form partial-depth cuts (dimples) into said sacrificial layer;
providing a low-stress silicon nitride layer;
depositing a layer of photoresist material on the low-stress nitride layer;
patterning the nitride layer by exposing the photoresist material to ultraviolet light through a photoresist mask to make it susceptible to a developer;
removing areas of the exposed photoresist material made susceptible to the developer by applying ultraviolet light to the exposed photoresist material and then cleaning the layered substrate base to remove excess material;
etching to form stator-to-substrate anchor areas for subsequent polysilicon deposition;
providing a second layer of polysilicon (POLY
1) for fabricating an initial layout of structural components of the gas-driven microturbine comprising the holding tank, reaction chamber, mechanical linkage arm, turbine housing, turbine shroud, turbine hub, exhaust port and mechanical linkage arm;
depositing a layer of said photoresist material on the POLY 1 layer;
patterning the POLY 1 layer by exposing the photoresist material to ultraviolet light through a photoresist mask to make it susceptible to a developer;
removing areas of the exposed photoresist material made susceptible to the developer by applying ultraviolet light to the exposed photoresist material and then cleaning the layered substrate base to remove excess material;
etching to form full-depth cuts into said POLY 1 layer;
undercutting said POLY 1 layer to form pin joint cavities;
backfilling said full-depth cuts and pin joint cavities with an oxide followed by annealing the layered substrate base in nitrogen;
providing a low-stress silicon nitride layer to form a friction-reduction layer;
depositing a layer of photoresist material on the low-stress silicon nitride layer;
patterning the low-stress silicon nitride layer by exposing the photoresist material to ultraviolet light through a photoresist mask to make it susceptible to a developer;
removing areas of the exposed photoresist material made susceptible to the developer by applying ultraviolet light to the exposed photoresist material and then cleaning the layered substrate base to remove excess material;
etching to remove backfill oxide from the pin joint cavities, to form pin joint connections, and to form anchor areas for connecting to the POLY 1 layer;
providing a third layer of polysilicon deposition (POLY
2) for fabricating a second structural layer of the gas-driven microturbine, comprising a turbine and turbine blades;
depositing a layer of photoresist material on the POLY 2 layer;
patterning the POLY 2 layer by exposing the photoresist material to ultraviolet light through a photoresist mask to make it susceptible to a developer;
removing areas of the exposed photoresist material made susceptible to the developer by applying ultraviolet light to the exposed photoresist material and then cleaning the layered substrate base to remove excess material;
etching to form the turbine and individual turbine blades;
providing a third layer of oxide to form a third sacrificial layer;
depositing a layer of photoresist material on the third sacrificial layer;
patterning the third sacrificial layer by exposing the photoresist material to ultraviolet light through a photoresist mask to make it susceptible to a developer;
removing areas of the exposed photoresist material made susceptible to the developer by applying ultraviolet light to the exposed photoresist material and then cleaning the layered substrate base to remove excess material;
etching to form partial-depth cuts in the third sacrificial layer;
etching to create full-depth cuts areas through the third sacrificial layer to form anchor areas for connecting subsequent depositions to the POLY 2 layer and for anchoring the POLY 2 level to said substrate base, to form a fuel delivery system comprising at least one inlet tube, and to further refine the turbine housing, turbine shroud, turbine, pin joints, mechanical linkage arm reaction chamber, and exhaust port;
providing a fourth layer of polysilicon deposition (POLY
3) for fabricating a third and final structural layer;
annealing the substrate base and POLY 3, POLY 2, and POLY 1 levels in nitrogen to ensure that said polysilicon mechanical films do not exhibit undesired internal stress which would cause deformation of the final structural layer;
depositing a layer of photoresist material on the POLY 3 layer;
patterning the POLY 3 layer by exposing the photoresist material to ultraviolet light through a photoresist mask to make it susceptible to a developer;
removing areas of the exposed photoresist material made susceptible to the developer by applying ultraviolet light to the exposed photoresist material and then cleaning the layered substrate base to a hydrofluoric acid dip to remove excess material;
etching to form and to complete fabrication of the mechanical linkage arm, holding tank, delivery system comprising said at least one inlet tube, reaction chamber, turbine shroud, exhaust port, and actuated element;
performing a final release etch of gas-driven microturbine structure to produce free-standing micropropulsion components and to allow rotatable elements to rotate and linearly movable elements to perform linear movement.
-
Specification