×

Apparatus for optical inspection of wafers during polishing

  • US 6,368,181 B1
  • Filed: 02/04/2000
  • Issued: 04/09/2002
  • Est. Priority Date: 05/23/1995
  • Status: Expired due to Term
First Claim
Patent Images

1. A semiconductor article processing apparatus comprising:

  • a processing unit having a working area for processing a top layer of an article;

    an optical measurement station adjacent to said processing unit; and

    a transporter for transporting said article between said processing unit and said optical measurement station;

    said optical measurement station located outside said working area and comprising;

    an optical measuring unit for measuring a desired parameter of said top layer and;

    a holding unit for receiving and holding said article in a stationary measurement position;

    said holding unit having a window, through which at least a portion of the top layer of said article is viewable by said optical measuring unit.

View all claims
  • 0 Assignments
Timeline View
Assignment View
    ×
    ×