Diamond grid CMP pad dresser

• US 6,368,198 B1
• Filed: 04/26/2000
• Issued: 04/09/2002
• Est. Priority Date: 11/22/1999
• Status: Expired due to Term

• Current Assignee: Kinik Company
• Original Assignee: Kinik Company
• Inventors: Sung, Chien-Min, Lin, Frank
• Primary Examiner(s): Hail, III, Joseph J.
• Assistant Examiner(s): OJINI, EZIAMARA ANTHONY
• Application Number:
  US09/558,582
• Time in Patent Office: 713 Days
• Field of Search: 451/56, 451/41, 451/443, 451/444, 451/285, 451/287, 451/526, 451/539, 451/540, 451/548
• US Class Current: 451/443
• CPC Class Codes: B24B 53/017 Devices or means for dressing, cleaning or otherwise conditioning lapping tools
• CPC Class Codes: B24B 53/12 Dressing tools; Holders therefor
• CPC Class Codes: B24D 2203/00 Tool surfaces formed with a pattern
• CPC Class Codes: B24D 3/06 metallic or mixture of metals with ceramic materials, e.g. hard metals, "cermets", cements
• CPC Class Codes: B24D 7/02 Wheels in one piece

Abstract

The present invention discloses a CMP pad dresser which has a plurality of uniformly spaced abrasive particles protruding therefrom. The abrasive particles are super hard materials, and are typically diamond, polycrystalline diamond (PCD), cubic boron nitride (cBN), or polycrystalline cubic boron nitride(PcBN). The abrasive particles are brazed to a substrate which may be then coated with an additional anti-corrosive layer. The anti-corrosive layer is usually a diamond or diamond-like carbon which is coated over the surface of the disk to prevent erosion of the brazing alloy by the chemical slurry used in conjunction with the CMP pad. This immunity to chemical attack allows the CMP pad dresser to dress the pad while it is polishing a workpiece. In addition to even spacing on the substrate, the abrasive particles extend for a uniform distance away from the substrate, allowing for even grooming or dressing of a CMP pad both in vertical and horizontal directions. A method of producing such a CMP pad dresser is also disclosed.

Claims

1. A method of making a chemical mechanical polishing (CMP) pad dresser comprising the steps of:

a) providing a substrate member;

b) placing a template having a predetermined pattern of apertures formed therein on a sheet of braze alloy;

c) filling the apertures of the template with abrasive particles;

d) removing any abrasive particles which are not in a template aperture;

e) pressing the abrasive particles contained in the apertures into the sheet of braze alloy, such that said abrasive particles become partially embedded in the braze alloy;

f) removing the template, such that the abrasive particles remain in place on the sheet of braze alloy; and

g) attaching the sheet of braze alloy containing the abrasive particles to the substrate.

2. The CMP pad dresser making method of claim 1, wherein said abrasive particles are crystalline particles of either diamond or cubic boron nitride, either as single crystals or in polycrystalline form.

3. The CMP pad dresser making method of claim 1, wherein said apertures have a size sufficient to accommodate only one abrasive particle.

4. The CMP pad dresser making method of claim 3, wherein said apertures have a predetermined size selected to accommodate abrasive particles of a predetermined size.

5. The CMP pad dresser making method of claim 1, wherein said abrasive particles each have a size within the range of about 100 to 350 micrometers.

6. The CMP pad dresser making method of claim 1, wherein said abrasive particles are substantially uniform in size, such that all abrasive particles have a size within 50 micrometers of each other.

7. The CMP pad dresser making method of claim 1, wherein said apertures of the predetermined pattern are spaced in a manner sufficient to produce a predetermined distance between any two particles.

8. The CMP pad dresser making method of claim 7, wherein said predetermined distance between each particle is about 1.5 to about 10 times the size of the particles.

9. The CMP pad dresser making method of claim 1, wherein said predetermined pattern of apertures is a grid.

10. The CMP pad dresser making method of claim 1, wherein said abrasive particles have a euhedral shape.

11. The CMP pad dresser making method of claim 1, wherein said abrasive particles have a predetermined shape.

12. The CMP pad dresser making method of claim 1, wherein said abrasive particles have a sharp point oriented away from the surface of the substrate.

13. The CMP pad dresser making method of claim 1, wherein said substrate member is made of a metallic material.

14. The CMP pad dresser making method of claim 13, wherein said metallic material is stainless steel.

15. The CMP pad dresser making method of claim 1, wherein said sheet of braze alloy is fabricated by the steps of bonding braze alloy particles together with an organic binder and forming said bonded particles into a sheet of desired thickness.

16. The CMP pad dresser making method of claim 15, wherein said step of forming braze alloy particles into a sheet is accomplished by either rolling, extruding, or tape casting.

17. The CMP pad dresser making method of claim 1, wherein said braze alloy comprises a nickel alloy having a chromium amount of at least about 2 wt %.

18. The CMP pad dresser making method of claim 1, wherein said sheet of braze alloy has a post brazing thickness sufficient to allow exposure of between about 10-90% of each abrasive particle above the brazing alloy.

19. A method of making a chemical mechanical polishing (CMP) pad dresser comprising the steps of:

a) providing a substrate member;

b) uniformly spacing a plurality of abrasive particles upon a surface of said substrate; and

c) affixing said abrasive particles to the substrate such that each abrasive particle extends within about 50 micrometers of a predetermined uniform height above the substrate.

20. A method of making a chemical mechanical polishing (CMP) pad dresser comprising the steps of:

a) providing a substrate member;

b) uniformly spacing a plurality of abrasive particles upon a surface of said substrate;

c) affixing said abrasive particles to the substrate such that each abrasive particle extends to a predetermined height above the substrate member; and

d) coating said abrasive particles and said braze alloy with an anti-corrosive layer.

21. The CMP pad dresser making method of claim 20, wherein the anti-corrosive layer is comprised of diamond, or diamond-like-carbon.

22. The CMP pad dresser making method of claim 20, where the anti-corrosive layer has a thickness of less than about 3 micrometers.

23. The CMP pad dresser making method of claim 20, wherein the diamond-like-carbon has an atomic carbon content of at least about 95%.

24. The CMP pad dresser making method of 20, wherein said coating step is accomplished using a cathodic arc method.