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Adjustable energy quantum thin film plasma processing system

  • US 6,368,477 B1
  • Filed: 11/10/1999
  • Issued: 04/09/2002
  • Est. Priority Date: 04/07/1995
  • Status: Expired due to Fees
First Claim
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1. A multiple power non arc-based thin film plasma processing system comprising:

  • a. a switch-mode power supply;

    b. a coating chamber having an anode and cathode;

    c. a solid material disposed within said coating chamber;

    d. a first power control system to which said switch-mode power supply is responsive and which affirmatively powers an arc preparatory to non arc-based processing;

    e. a second power control system to which said switch-mode power supply is responsive and which achieves non arc-based processing; and

    f. a switch to which said first and second power control systems are each responsive and which acts while said switch-mode power supply is operating.

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