Dual track/stepper interface configuration for wafer processing

• US 6,368,985 B1
• Filed: 05/30/2000
• Issued: 04/09/2002
• Est. Priority Date: 05/30/2000
• Status: Expired due to Fees

• Current Assignee: Advanced Micro Devices, Inc.
• Original Assignee: Advanced Micro Devices, Inc.
• Inventors: Wakamiya, Ted, Marinaro, Vince L., Kent, Eric R.
• Primary Examiner(s): Elms, Richard
• Assistant Examiner(s): Wilson, Christian D.
• Application Number:
  US09/580,078
• Time in Patent Office: 679 Days
• Field of Search: 396/611, 438/780
• US Class Current: 438/780
• CPC Class Codes: G03F 7/70525 Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
• CPC Class Codes: G03F 7/70991 Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
• CPC Class Codes: H01L 21/67225 comprising at least one lithography chamber lithographic apparatuses G03F7/00

Abstract

An apparatus for processing semiconductor wafers includes a single imaging stepper for exposing wafers processed on a first track and a second track. A method for processing semiconductor wafers includes selecting one of a first coater and a second coater for coating a first wafer with a photoresist. The coated wafer is exposed in a single stepper to form an exposed wafer. An operator selects one of a first developer and second developer to develop the exposed wafer.

Claims

1. A method for processing semiconductor wafers comprising:

providing a first coater and developer track having a first coater station and a first developer station;

providing a second coater and developer track having a second coater station and a second developer station;

providing a single stepper between the first coater and developer track and the second coater and developer track;

coating a first set of wafers with a photoresist material in the first coater station;

exposing the first set of wafers with a light source in the stepper;

developing the first set of wafers with a developer in the first developer station;

coating a second set of wafers with a second photoresist material in the second coater station;

exposing the second set of wafers with the light source in the stepper; and

developing the second set of wafers with the developer in the second developer station.

2. The method of claim 1, wherein coating the first set of wafers and coating the second set of wafers occurs concurrently.

3. The method of claim 2, wherein exposing the first set of wafers in the stepper occurs before exposing the second set of wafers in the stepper and further including holding the second set of wafers in a queue until the first set of wafers have been exposed.

4. The method of claim 2, wherein exposing the first set of wafers and exposing the second set of wafers includes exposing each individual wafer of the first and second set of wafers in the order in which the wafers were coated.

5. The method of claim 2, wherein exposing the first set of wafers and exposing the second set of wafers includes exposing at least one of the second set of wafers before all of the first set of wafers have been exposed.

6. The method of claim 1, further including moving the first set of wafers and second set of wafers with a wafer transfer system between the first track and the stepper, and the second track and the stepper respectively.

7. The method of claim 1, further including selecting a photoresist/developer combination for the coating and developing of each of the first and second sets of wafers.

8. A method for processing semiconductor wafers comprising:

providing a first track having a first coater and a first developer connected to and adjacent the first coater;

providing a second track having a second coater and a second developer connected to and adjacent the second coater;

providing a single stepper between the first track and the second track;

selecting one of the first coater and the second coater;

coating a first wafer with a photoresist from the one of the selected first and second coaters to form a coated wafer;

exposing the coated wafer with an image in the single stepper to form an exposed wafer; and

selecting one of the first developer and second developer;

developing the exposed wafer in the one of the selected first developer and second developer.

9. The method of claim 8, wherein the first wafer is coated with the first coater, and developed with the second developer.

10. The method of claim 8, further including conducting periodic maintenance on one of the first and second coater and developers while coating and developing the wafer with the other of the first and second coater and developers.

11. The method of claim 8 further including coating a second wafer with a photoresist in the other of the first and second coater to form a second coated wafer.

12. The method of claim 11, further including exposing the second coated wafer with the stepper after exposing the first coated wafer.

13. The method of claim 12, further including moving the first and second wafer with a wafer transfer system.

14. The method of claim 13, further including tracking the location of the first and second wafers through the process based on a predetermined input by an operator.

15. A method for processing semiconductor wafers comprising:

providing a first coater/developer track having a first coater station and a first developer station;

providing a second coater/developer track having a second coater station and a second developer station;

arranging the first and second coater/developer tracks perpendicular to one another such that they form an “

L”

shape;

providing a single stepper adjacent one end of the first coater/developer track and adjacent one end of the second coater/developer track;

coating a first set of wafers with a first photoresist material in the first coater station;

coating a second set of wafers with a second photoresist material in the second coater station; and

alternatingly exposing one of the wafers of the first set of wafers and one of the wafers of the second set of wafers with a light source in the stepper.

16. The method of claim 15, wherein the first photoresist material and the second photoresist material are different.

17. The method of claim 15, further including storing each wafer from the first set of wafers in a queue after coating each wafer from the first set of wafers and storing each wafer from the second set of wafers in the queue after coating each wafer from the second set of wafers.

18. The method of claim 17 further including moving each wafer after it has been exposed from the stepper to the queue.

19. The method of claim 18 wherein each wafer is moved from and to the queue with a wafer transfer system.

20. The method of claim 19, wherein each coated wafer is developed in one of the first and second developer stations.