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Method for manufacturing a micromechanical device

  • US 6,369,931 B1
  • Filed: 08/18/1999
  • Issued: 04/09/2002
  • Est. Priority Date: 12/22/1997
  • Status: Expired due to Term
First Claim
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1. A method for manufacturing a micromechanical device, comprising the steps of:

  • a) providing a three-layer structure which has a first layer, a second layer and a third layer, the second layer being disposed between the first layer and the third layer;

    b) etching through the first layer to the second layer to form an island region which is disposed on the second layer, the first layer including a first region which surrounds the island region and which joins the island region via at least one connecting web;

    c) etching through a second region, wherein the second region is part of the third layer and extends to the second layer; and

    d) removing a third region, wherein the third region is part of the second layer and disposed below the island region, wherein the removing is for enabling the island region to perform torsional vibrations about the at least one connecting web, the torsional vibrations having an amplitude for enabling a portion of the island region to extend into the second region.

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