Multilevel diffractive optical element

• US 6,369,948 B2
• Filed: 03/09/2001
• Issued: 04/09/2002
• Est. Priority Date: 09/14/1995
• Status: Expired due to Fees

• Current Assignee: Yeda Research and Development Co. Ltd. (Weizmann Institute of Science)
• Original Assignee: Yeda Research and Development Co. Ltd. (Weizmann Institute of Science)
• Inventors: Hasman, Erez, Danziger, Yochay, Friesem, Asher
• Primary Examiner(s): CHANG, AUDREY Y
• Application Number:
  US09/801,808
• Publication Number:
  US 20010015851A1
• Time in Patent Office: 396 Days
• Field of Search: 359/565, 359/566, 359/569, 359/571, 359/575, 359/573, 430/1, 430/2, 430/4
• US Class Current: 359/575
• CPC Class Codes: G02B 5/1876 Diffractive Fresnel lenses; Zone plates; Kinoforms G02B5/1842, G02B5/1847 take precedence; optical systems having diffractive correction means G02B27/0037; Fresnel lenses operating by refraction G02B3/08

Abstract

A multilevel diffractive optical element comprising a base and a plurality of phase zones having phase levels of a substantially identical height h, each phase zone being defined by a local modulation depth d and a local number of phase levels ξ=d/h, the local number of phase levels ξ per phase zone being a real number, an integer of which defines the number of complete levels in the phase zone, which complete levels have identical widths, and a fraction of which, in at least one phase zone, defines an incomplete level which is narrower than the complete levels, said local number of phase levels ξ=ξ(x, y) varying among different phase zones so as to provide corresponding variation of said local modulation depth d=d(x, y) whereby local diffraction efficiencies and consequently an overall diffraction efficiency of the optical element is arbitrarily controlled.

Claims

1. A method of producing a multilevel diffractive optical element having a phase function φ

=φ

(x, y) and phase zones of different local modulation depth d =d(x,y) defined by different numbers of phase levels ξ

=ξ

(x, y) per phase zone, each phase zone consisting of phase levels having identical width and, in at least one phase zone, one additional level that is narrower than the other levels in that zone, the phase levels of all phase zones being spaced, in the direction along the modulation depth, by a substantially identical distance h, said method comprising;

generating M binary amplitude masks having fringes configured to provide, in each phase zone, its local number of said phase levels $\mathrm{\xi <br><br>}<br><br>\left(x,y\right)=\frac{d<br><br>\left(x,y\right)}{h},$

 

the number M of masks being chosen so as to enable the production of a number of phase levels N₀, which is at least not less than a maximal number of phase levels per phase zone over the optical element; and

utilizing the masks serially for serial etching of said phase levels into said phase zones of the optical element;

wherein

at least some of said fringes have a varying width in accordance with the transmittance T_M of a binary amplitude mask, which varies, in each mask, in X and Y directions in accordance with the variation of φ

=φ

(x, y) and d=d(x,y), and is calculated in accordance with the mathematical function $T_M<br><br>\left(x,y\right)=T<br><br>\left\{\sin <br><br>\left(P<br><br>\text{\hspace{1em}<br><br>}<br><br>\mathrm{Mod}\left[\frac{\mathrm{\phi <br><br>}<br><br>\left(x,y\right)}{2<br><br>\text{\hspace{1em}<br><br>}<br><br>\mathrm{\pi <br><br>}}\right]<br><br>\frac{d<br><br>\left(x,y\right)}{d_0}\right)\right\}$

where

T(x)=1 for x>

0,t(x)=0 for x≦

0,

P is a parameter which is defined by a serial number of the mask, and which determines a number of the fringes provided in said mask for each phase zone, and d₀ is a maximal achievable modulation depth;

d₀=N₀·

h.

2. A method for producing a multilevel diffractive optical element according to claim 1, wherein said etching is performed for different masks with different etching depths which are related by a fixed ratio.

3. A method for producing a multilevel diffractive optical element according to claim 1, wherein the parameter P equals 2^M−

1 and said etching is performed for different masks with different etching depths such that the etching depth produced by a mask is twice the etching depth produced by the preceding mask.

4. A method for producing a multilevel diffractive optical element according to claim 1, wherein calculation of the binary amplitude transmittance of the masks comprises mathematical compensation for phase shifts.

5. A method for producing a multilevel diffractive optical element according to claim 4, wherein, for the purpose of compensation of fabrication errors, the transmittance T_M of each binary amplitude mask is calculated based on an increase of a duty cycle Δ

q of the mask in accordance with the mathematical function $\begin{array}{c}{T}_M<br><br>\left(x,y\right)=\text{\hspace{1em}<br><br>}<br><br>T<br><br>\{\sin <br><br>\left(2^{M-1}<br><br>\frac{d<br><br>\left(x,y\right)}{d_0}<br><br>\left\{\mathrm{Mod}<br><br>\text{\hspace{1em}<br><br>}\left[\frac{\mathrm{\phi <br><br>}<br><br>\left(x,y\right)+\mathrm{\pi <br><br>}<br><br>\text{\hspace{1em}<br><br>}<br><br>\mathrm{\Delta <br><br>}<br><br>\text{\hspace{1em}<br><br>}<br><br>q}{2^{M-1}}\right]-\frac{\mathrm{\pi <br><br>}<br><br>\text{\hspace{1em}<br><br>}<br><br>\mathrm{\Delta <br><br>}<br><br>\text{\hspace{1em}<br><br>}<br><br>q}{2^{M-1}}\right\}\right)+\\ \text{\hspace{1em}<br><br>}<br><br>\sin <br><br>\text{\hspace{1em}<br><br>}<br><br>\left(\mathrm{\pi <br><br>}<br><br>\text{\hspace{1em}<br><br>}<br><br>\frac{d<br><br>\left(x,y\right)}{d_0}<br><br>\mathrm{\Delta <br><br>}<br><br>\text{\hspace{1em}<br><br>}<br><br>q\right)\}\end{array}$

where $\mathrm{\Delta <br><br>}<br><br>\text{\hspace{1em}<br><br>}<br><br>q=\mathrm{\Delta <br><br>}<br><br>\text{\hspace{1em}<br><br>}<br><br>x<br><br>\frac{\nabla <br><br>\mathrm{\phi <br><br>}}{2<br><br>\text{\hspace{1em}<br><br>}<br><br>\mathrm{\pi <br><br>}}$

where $\left|\nabla <br><br>\mathrm{\phi <br><br>}\right|=\left|\frac{\partial <br><br>\mathrm{\phi <br><br>}}{\partial <br><br>x}\right|$

and Δ

x is a width of an error introduced by the first mask.

6. A method for producing a multilevel diffractive optical element according to claim 1, wherein each phase zone of the optical element has a predetermined local efficiency in a predetermined m-th diffraction order, whereby the optical element has a desired distribution of its overall diffraction efficiency, and wherein the distance h between the phase levels is of its optimized value h_opt determined by:

calculating, for each phase zone, an optimal local modulation depth d_opt, which the phase zone would have, in order to ensure 100% local diffraction efficiency in said predetermined m-th diffraction order, if the phase zone profile were continuous rather than multilevel;

calculating local minimal numbers of phase levels ξ

_min which are required to provide for the desired distribution of the diffraction efficiency, assuming that all the phase zones have their optimal local modulation depths d_opt and that the distance h between the phase levels in the phase zones is a free parameter; and

calculating local distances between the phase levels in each phase zone as h=d_opt/ξ

_min, the local distance of a minimal magnitude being chosen as the optimized magnitude h,pt of the distance between the phase levels.

7. A method for producing a multilevel diffractive optical element according to claim 1, wherein a maximal number of phase levels obtained thereby is 2^M.

8. A method for producing a diffractive optical element according to claim 1, wherein at least some of said fringes extend along a part of the length of their corresponding masks.