Template mask lithography utilizing structured beam
First Claim
1. A method for lithographic patterning of a plurality of identical structures onto a target substrate, whereina template mask bearing a template structure pattern, comprising a plurality of identical template structures each consisting of a set of at least one structure element of circular shape, is used for lithographic patterning of the target substrate, wherein by means of a broad beam of energetic radiation the template mask is illuminated to form a structured beam and the template structure pattern is imaged onto the target substrate by means of the structured beam, the target substrate being positioned after the mask as seen in the optical path of the beam and comprising material sensitive to exposure to said energetic radiation, producing a pattern image on the target substrate, the pattern image thus produced comprising a plurality of identical target structures.
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Abstract
For lithographic patterning a plurality of identical structures (24) onto a target substrate (14), a template mask (13) is produced which bears a template structure pattern comprising a plurality of identical template structures each consisting of a set of at least one structure element (C) of circular shape. Starting from a primary mask (11) bearing a primary structure pattern consisting of at least one structure element having a circular shape, the production of the template mask is done in at least one lithographic mask structuring step (b, c) wherein in each mask structuring step by means of a broad beam (31) of energetic radiation the mask is illuminated and a structure pattern on the mask (11,12) is imaged onto an intermediate substrate (12a,13a); in these mask structuring steps the pattern image imaged from the structure pattern is moved over the intermediate substrate to a number of different locations. From the intermediate substrate (12a,13a) thus patterned another mask (12,13) having a structure pattern corresponding to the pattern image is produced, respectively. The mask produced from the last of said mask structuring steps is the template mask (13). By means of the template mask (13) a target substrate (14) is patterned in a final lithographic patterning step, the pattern image thus produced comprising a plurality of identical target structures (24).
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Citations
18 Claims
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1. A method for lithographic patterning of a plurality of identical structures onto a target substrate, wherein
a template mask bearing a template structure pattern, comprising a plurality of identical template structures each consisting of a set of at least one structure element of circular shape, is used for lithographic patterning of the target substrate, wherein by means of a broad beam of energetic radiation the template mask is illuminated to form a structured beam and the template structure pattern is imaged onto the target substrate by means of the structured beam, the target substrate being positioned after the mask as seen in the optical path of the beam and comprising material sensitive to exposure to said energetic radiation, producing a pattern image on the target substrate, the pattern image thus produced comprising a plurality of identical target structures.
Specification