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Template mask lithography utilizing structured beam

  • US 6,372,391 B1
  • Filed: 09/25/2000
  • Issued: 04/16/2002
  • Est. Priority Date: 09/25/2000
  • Status: Expired due to Term
First Claim
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1. A method for lithographic patterning of a plurality of identical structures onto a target substrate, whereina template mask bearing a template structure pattern, comprising a plurality of identical template structures each consisting of a set of at least one structure element of circular shape, is used for lithographic patterning of the target substrate, wherein by means of a broad beam of energetic radiation the template mask is illuminated to form a structured beam and the template structure pattern is imaged onto the target substrate by means of the structured beam, the target substrate being positioned after the mask as seen in the optical path of the beam and comprising material sensitive to exposure to said energetic radiation, producing a pattern image on the target substrate, the pattern image thus produced comprising a plurality of identical target structures.

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